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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 47, Iss. 13 — May. 1, 2008
  • pp: C88–C97

Roughness evolution and scatter losses of multilayers for 193 nm optics

Sven Schröder, Angela Duparré, and Andreas Tünnermann  »View Author Affiliations


Applied Optics, Vol. 47, Issue 13, pp. C88-C97 (2008)
http://dx.doi.org/10.1364/AO.47.000C88


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Abstract

Optical scattering arising from interface roughness and interference effects is a dominant loss mechanism of thin film coatings for 193 n m . A procedure is presented where at-wavelength scatter measurements in combination with atomic force microscopy are used as a tool for the in-depth characterization of the origins of scattering. For highly reflective coatings, the influence of the substrate roughness on the growth properties is analyzed. Moreover, the effects of interface roughness and optical thickness deviations on the scattering properties are separated. Furthermore, the procedure was used to investigate scattering properties of coatings at 45° incidence and of coatings applied in immersion fluid that so far could not be accessed by direct measurement.

© 2008 Optical Society of America

OCIS Codes
(120.5820) Instrumentation, measurement, and metrology : Scattering measurements
(120.6660) Instrumentation, measurement, and metrology : Surface measurements, roughness
(240.0240) Optics at surfaces : Optics at surfaces
(240.0310) Optics at surfaces : Thin films
(290.5820) Scattering : Scattering measurements

History
Original Manuscript: July 31, 2007
Revised Manuscript: September 24, 2007
Manuscript Accepted: September 28, 2007
Published: November 28, 2007

Citation
Sven Schröder, Angela Duparré, and Andreas Tünnermann, "Roughness evolution and scatter losses of multilayers for 193 nm optics," Appl. Opt. 47, C88-C97 (2008)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-47-13-C88


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References

  1. M. LaPedus, "Matsushita enters 45-nm production," EE Times Online (2007), http://www.eetimes.com/showArticle.jhtml?articleID=199905335, last visited on 28 June 2007.
  2. B. W. Smith, Y. Fan, M. Slocum, and L. Zavyalova, "25 nm immersion lithography at a 193 nm wavelength," Proc. SPIE 5754, 141-147 (2005).
  3. B. J. Lin, "Optical lithography: present and future challenges," C. R. Physique 7, 858-874 (2006).
  4. T. Zell, "Present and future of 193 nm lithography," Microelectron. Eng. 83, 624-633 (2006).
  5. W. M. Tong and R. S. Williams, "Kinetics of surface growth: phenomenology, scaling, and mechanisms of smoothening and roughening," Annu. Rev. Chem. 45, 401-438 (1994).
  6. B. A. Movchan and A. V. Demchishin, "Investigations of the structure and properties of thick Ni, Ti, W, Al2O3, and ZrO2 vacuum condensates," Phys. Met. Metallogr. USSR 28, 83 (1969).
  7. J. A. Thornton, "Structure and topography of sputtered coatings," Annu. Rev. Mater. Sci. 7, 239-260 (1977).
  8. R. Messier, "Toward quantification of thin film morphology," J. Vac. Sci. Technol. A 4/3, 490-495 (1986).
  9. H. A. Macleod, "Structure-related optical properties of thin films," J. Vac. Sci. Technol. A 4, 418-422 (1986).
  10. A. Duparré, "Scattering from surfaces and thin films," in Encyclopedia of Modern Optics, B. D. Guenther, D. G. Steel, and L. Bayvel, eds. (Elsevier, 2004).
  11. J. C. Stover, Optical Scattering: Measurement and Analysis, 2nd ed., Vol. PM24 of the Press Monographs (SPIE, 1995).
  12. J. M. Bennett and L. Mattson, Introduction to Surface Roughness and Scattering (Optical Society of America, 1989).
  13. A. Duparré, J. Ferre-Borrull, S. Gliech, G. Notni, J. Steinert, and J. M. Bennett, "Surface characterization techniques for determining the root-mean-square roughness and power spectral densities of optical components," Appl. Opt. 41, 154-171 (2002).
  14. M. Flemming, K. Roder, and A. Duparré, "Scanning force microscopy for optical surface metrology," Proc. SPIE 5965, 0A (2005).
  15. A. Duparré, "Light scattering of thin dielectric films," in Thin Films for Optical Coatings, R. E. Hummel and K. H. Guenther, eds., Vol. 1 of Handbook of Optical Properties Series (CRC, 1995), pp. 273-304.
  16. J. M. Elson, J. P. Rahn, and J. M. Bennett, "Light scattering from multilayer optics: comparison of theory and experiment," Appl. Opt. 19, 669-679 (1980).
  17. P. Bousquet, F. Flory, and P. Roche, "Scattering from multilayer thin films: theory and experiment," J. Opt. Soc. Am. 71, 1115-1123 (1981).
  18. C. K. Carniglia, "Scalar scattering theory for multilayer optical coatings," Opt. Eng. 18, 104-115 (1979).
  19. J. M. Elson, J. P. Rahn, and J. M. Bennett, "Relationship of the total integrated scattering from multilayer-coated optics to the angle of incidence, polarization, correlation length, and roughness cross-correlation properties," Appl. Opt. 22, 3207-3219 (1983).
  20. "Optics and optical instruments - Test methods for radiation scattered by optical components," ISO 13696:2002 (International Organization for Standardization (2002).
  21. S. Schröder, S. Gliech, and A. Duparré, "Scattering analysis of optical components in the DUV," Proc. SPIE 6101, 1H (2006).
  22. S. Schröder, S. Gliech, and A. Duparré, "Sensitive and flexible light scatter techniques from the VUV to IR regions," Proc. SPIE 5965, 424-432 (2005).
  23. C. Amra, D. Torricini, and P. Roche, "Multiwavelength (0.45-10.6 μm) angle-resolved scatterometer or how to extend the optical window," Appl. Opt. 32, 5462-5474 (1993).
  24. S. Schröder, S. Gliech, and A. Duparré, "Measurement system to determine the total and angle resolved light scattering of optical components in the deep-ultraviolet and vacuum-ultraviolet spectral regions," Appl. Opt. 44, 6093-6107 (2005).
  25. C. Amra, "Light scattering from multilayer optics. II. Application to experiment," J. Opt. Soc. Am. A 11, 211-226 (1994).
  26. C. Amra, J. H. Apfel, and E. Pelletier, "Role of interface correlation in light scattering by a multilayer," Appl. Opt. 31, 3134-3151 (1992).
  27. H. Uhlig, R. Thielsch, J. Heber, and N. Kaiser, "Lanthanide tri-fluorides: a survey of the optical, mechanical and structural properties of thin films with emphasis of their use in the DUV-VUV spectral range," Proc. SPIE 5963, 0N (2005).
  28. J. Ferré-Borrull, A. Duparré, and E. Quesnel, "Procedure to characterize microroughness of optical thin films: application to ion-beam-sputtered vacuum-ultraviolet coatings," Appl. Opt. 40, 2190-2199 (2001).
  29. M. Adamik, G. Sáfrán, P. B. Barna, I. Tomov, U. Kaiser, S. Laux, J. Jinschek, and W. Richter, "Structure evolution of NdF3 optical thin films," Phys. Status Solidi A 175, 637-649 (1999).
  30. J. E. Rudisill, A. Duparré, and S. Schröder, "Determination of scattering losses in ArF* excimer laser all-dielectric mirrors for 193 nm microlithography application," Proc. SPIE 5647, 9-22 (2005).
  31. M. Flemming and A. Duparré, "Design and characterization of nanostructured ultrahydrophobic coatings," Appl. Opt. 45, 1397-1401 (2006).

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