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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 47, Iss. 13 — May. 1, 2008
  • pp: C88–C97

Roughness evolution and scatter losses of multilayers for 193 nm optics

Sven Schröder, Angela Duparré, and Andreas Tünnermann  »View Author Affiliations


Applied Optics, Vol. 47, Issue 13, pp. C88-C97 (2008)
http://dx.doi.org/10.1364/AO.47.000C88


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Abstract

Optical scattering arising from interface roughness and interference effects is a dominant loss mechanism of thin film coatings for 193 n m . A procedure is presented where at-wavelength scatter measurements in combination with atomic force microscopy are used as a tool for the in-depth characterization of the origins of scattering. For highly reflective coatings, the influence of the substrate roughness on the growth properties is analyzed. Moreover, the effects of interface roughness and optical thickness deviations on the scattering properties are separated. Furthermore, the procedure was used to investigate scattering properties of coatings at 45° incidence and of coatings applied in immersion fluid that so far could not be accessed by direct measurement.

© 2008 Optical Society of America

OCIS Codes
(120.5820) Instrumentation, measurement, and metrology : Scattering measurements
(120.6660) Instrumentation, measurement, and metrology : Surface measurements, roughness
(240.0240) Optics at surfaces : Optics at surfaces
(240.0310) Optics at surfaces : Thin films
(290.5820) Scattering : Scattering measurements

History
Original Manuscript: July 31, 2007
Revised Manuscript: September 24, 2007
Manuscript Accepted: September 28, 2007
Published: November 28, 2007

Citation
Sven Schröder, Angela Duparré, and Andreas Tünnermann, "Roughness evolution and scatter losses of multilayers for 193 nm optics," Appl. Opt. 47, C88-C97 (2008)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-47-13-C88

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