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Applied Optics

Applied Optics


  • Editor: James C. Wyant
  • Vol. 47, Iss. 13 — May. 1, 2008
  • pp: C9–C12

Using fence post designs to speed the atomic layer deposition of optical thin films

Ronald R. Willey  »View Author Affiliations

Applied Optics, Vol. 47, Issue 13, pp. C9-C12 (2008)

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Atomic layer deposition (ALD) at this time is much slower than conventional optical thin-film deposition techniques. A more rapid ALD process for SiO 2 has been developed than for other ALD materials. A fence post design for optical thin films has thin layers of high-index posts standing above a broad low-index ground. If a design for ALD can be predominantly composed of SiO 2 layers with thin high-index layers, the deposition times can be correspondingly shortened, and it is shown that the required performance can still be nearly that of more conventional designs with high- and low-index layers of equal thickness. This combination makes the ALD benefits of conformal coating and precise thickness control more practical for optical thin-film applications.

© 2008 Optical Society of America

OCIS Codes
(310.0310) Thin films : Thin films
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication
(310.6805) Thin films : Theory and design

Original Manuscript: July 17, 2007
Manuscript Accepted: September 12, 2007
Published: October 24, 2007

Ronald R. Willey, "Using fence post designs to speed the atomic layer deposition of optical thin films," Appl. Opt. 47, C9-C12 (2008)

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