Application of an interferometric phase contrast method to fabricate arbitrary diffractive optical elements
Applied Optics, Vol. 47, Issue 14, pp. 2550-2556 (2008)
http://dx.doi.org/10.1364/AO.47.002550
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Abstract
A novel approach for the fabrication of diffractive optical elements is described. This approach is based on an interferometric phase contrast method that transforms a complex object wavefront into an intensity pattern. The resulting intensity pattern is used to expose a photoresist layer on a substrate. After development, a diffractive phase object with an on-axis diffraction pattern is achieved. We show that the interferometric phase contrast method allows a precise control of the resulting intensity pattern. An array of blazed Fresnel lenses is realized in photoresist by using kinoform or detour-phase computer holograms for the interferometric phase contrast setup.
© 2008 Optical Society of America
OCIS Codes
(090.0090) Holography : Holography
(100.5070) Image processing : Phase retrieval
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(220.4000) Optical design and fabrication : Microstructure fabrication
ToC Category:
Optical Design and Fabrication
History
Original Manuscript: January 30, 2008
Revised Manuscript: March 28, 2008
Manuscript Accepted: April 10, 2008
Published: May 2, 2008
Citation
Marcel Teschke, Robert Heyer, Marco Fritzsche, Sebastian Stoebenau, and Stefan Sinzinger, "Application of an interferometric phase contrast method to fabricate arbitrary diffractive optical elements," Appl. Opt. 47, 2550-2556 (2008)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-47-14-2550
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