Sapphire-GaN-based planar integrated free-space optical system
Applied Optics, Vol. 47, Issue 16, pp. 2950-2955 (2008)
http://dx.doi.org/10.1364/AO.47.002950
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Abstract
We report on the design and fabrication of a planar integrated free-space optical system working on the basis of binary phase diffractive optical elements (DOEs) realized in GaN on a sapphire substrate. Group III-nitride/sapphire substrates enable the parallel monolithic integration of passive microoptical elements like lenses and gratings as demonstrated here and optoelectronic devices like light emitters and photodetectors on a single wafer. We present an approach for the simultaneous optimization of the efficiency of transmissive and reflective diffractive optical elements processed in a single lithographic etching step.
© 2008 Optical Society of America
OCIS Codes
(050.1380) Diffraction and gratings : Binary optics
(050.1970) Diffraction and gratings : Diffractive optics
(220.3740) Optical design and fabrication : Lithography
(310.1860) Thin films : Deposition and fabrication
(130.3990) Integrated optics : Micro-optical devices
ToC Category:
Diffraction and Gratings
History
Original Manuscript: January 9, 2008
Revised Manuscript: April 2, 2008
Manuscript Accepted: April 29, 2008
Published: May 21, 2008
Citation
M. Hofmann, S. Hauguth-Frank, V. Lebedev, O. Ambacher, and S. Sinzinger, "Sapphire-GaN-based planar integrated free-space optical system," Appl. Opt. 47, 2950-2955 (2008)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-47-16-2950
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