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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 47, Iss. 18 — Jun. 20, 2008
  • pp: 3221–3230

Three-beam-interference lithography: contrast and crystallography

Justin L. Stay and Thomas K. Gaylord  »View Author Affiliations


Applied Optics, Vol. 47, Issue 18, pp. 3221-3230 (2008)
http://dx.doi.org/10.1364/AO.47.003221


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Abstract

Specific configurations of three linearly polarized, monochromatic plane waves have previously been shown to be capable of producing interference patterns exhibiting symmetry inherent in 5 of the 17 plane groups. Starting with the general expression for N linearly polarized waves, three-beam interference is examined in detail. The totality of all possible sets of constraints for producing the five plane groups is presented. In addition, two uniform contrast conditions are identified and discussed. Further, it is shown that when either of the uniform contrast conditions is applied and the absolute contrast is maximized, unity absolute contrast is achievable.

© 2008 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(110.3960) Imaging systems : Microlithography
(220.3740) Optical design and fabrication : Lithography
(110.4235) Imaging systems : Nanolithography
(350.4238) Other areas of optics : Nanophotonics and photonic crystals
(050.5298) Diffraction and gratings : Photonic crystals

ToC Category:
Diffraction and Gratings

History
Original Manuscript: February 20, 2008
Manuscript Accepted: April 19, 2008
Published: June 11, 2008

Citation
Justin L. Stay and Thomas K. Gaylord, "Three-beam-interference lithography: contrast and crystallography," Appl. Opt. 47, 3221-3230 (2008)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-47-18-3221

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