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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 47, Iss. 18 — Jun. 20, 2008
  • pp: 3364–3368

Reflective performance of Ir film in vacuum ultraviolet wavelength region

Gan Shuyi, Hong Yilin, Xu Xiangdong, Liu Yin, Zhou Hongjun, Huo Tonglin, and Fu Shaojun  »View Author Affiliations


Applied Optics, Vol. 47, Issue 18, pp. 3364-3368 (2008)
http://dx.doi.org/10.1364/AO.47.003364


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Abstract

This paper theoretically and experimentally investigates the reflective performance of Ir films in the vacuum ultraviolet wavelength region. Ir reflecting layers of different thicknesses on various substrates are calculated and fabricated by the ion-beam-sputtering technique. Their reflectance in the 115 nm to 140 nm wavelength region was measured continuously by a reflectometer located at the National Synchrotron Radiation Laboratory. The testing results show that the reflectance of Si substrates is quite sensitive to the deposited Ir layer thickness, while the reflectance on a quartz or a BK7 glass substrates is higher. The energy of the sputtering ion beam exerts a significant influence on the reflectance of the layer, and the postannealing can cause a substantial decrease in the reflectance. For normal incidence, the reflectance of an Ir film on BK7 glass can reach as high as 30%.

© 2008 Optical Society of America

OCIS Codes
(120.5700) Instrumentation, measurement, and metrology : Reflection
(230.4040) Optical devices : Mirrors
(240.0240) Optics at surfaces : Optics at surfaces
(310.0310) Thin films : Thin films

ToC Category:
Thin Films

History
Original Manuscript: February 28, 2008
Revised Manuscript: May 22, 2008
Manuscript Accepted: May 29, 2008
Published: June 18, 2008

Citation
Gan Shuyi, Hong Yilin, Xu Xiangdong, Liu Yin, Zhou Hongjun, Huo Tonglin, and Fu Shaojun, "Reflective performance of Ir film in vacuum ultraviolet wavelength region," Appl. Opt. 47, 3364-3368 (2008)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-47-18-3364

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