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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 47, Iss. 22 — Aug. 1, 2008
  • pp: E39–E43

Polynomial phase masks for extending the depth of field of a microscope

Nicolas Caron and Yunlong Sheng  »View Author Affiliations


Applied Optics, Vol. 47, Issue 22, pp. E39-E43 (2008)
http://dx.doi.org/10.1364/AO.47.000E39


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Abstract

A polynomial phase mask is designed and fabricated for enhancing the depth of field of a microscope by more than tenfold. A generic polynomial of degree 31 that consists of 16 odd power terms is optimized by simulated annealing with a realistic average modulation transfer function (MTF) iteratively set as the target MTF. Optical experimental results are shown.

© 2008 Optical Society of America

OCIS Codes
(110.0110) Imaging systems : Imaging systems
(110.0180) Imaging systems : Microscopy
(110.7348) Imaging systems : Wavefront encoding

ToC Category:
Optical Design and Optical Synthesis

History
Original Manuscript: January 8, 2008
Revised Manuscript: March 29, 2008
Manuscript Accepted: April 10, 2008
Published: May 9, 2008

Virtual Issues
Vol. 3, Iss. 9 Virtual Journal for Biomedical Optics

Citation
Nicolas Caron and Yunlong Sheng, "Polynomial phase masks for extending the depth of field of a microscope," Appl. Opt. 47, E39-E43 (2008)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-47-22-E39

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