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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 47, Iss. 26 — Sep. 10, 2008
  • pp: 4767–4776

Novel approaches to the design of halftone masks for analog lithography

Marcel Teschke and Stefan Sinzinger  »View Author Affiliations


Applied Optics, Vol. 47, Issue 26, pp. 4767-4776 (2008)
http://dx.doi.org/10.1364/AO.47.004767


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Abstract

We report novel approaches to the design of halftone masks for analog lithography. The approaches are derived from interferometric phase contrast. In a first step we show that the interferometric phase-contrast method with detour holograms can be reduced into a single binary mask. In a second step we introduce the interferometric phase-contrast method by interference of the object wavefront with the conjugate object wavefront. This method also allows for a design of a halftone mask. To use kinoform holograms as halftone phase masks, we show in a third step the combination of the zeroth-order phase-contrast technique with the interferometric phase-contrast method.

© 2008 Optical Society of America

OCIS Codes
(100.5070) Image processing : Phase retrieval
(220.3740) Optical design and fabrication : Lithography
(220.4000) Optical design and fabrication : Microstructure fabrication

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: April 21, 2008
Revised Manuscript: July 18, 2008
Manuscript Accepted: July 20, 2008
Published: September 9, 2008

Citation
Marcel Teschke and Stefan Sinzinger, "Novel approaches to the design of halftone masks for analog lithography," Appl. Opt. 47, 4767-4776 (2008)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-47-26-4767

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