We report novel approaches to the design of halftone masks for analog lithography. The approaches are derived from interferometric phase contrast. In a first step we show that the interferometric phase-contrast method with detour holograms can be reduced into a single binary mask. In a second step we introduce the interferometric phase-contrast method by interference of the object wavefront with the conjugate object wavefront. This method also allows for a design of a halftone mask. To use kinoform holograms as halftone phase masks, we show in a third step the combination of the zeroth-order phase-contrast technique with the interferometric phase-contrast method.
© 2008 Optical Society of America
Optical Design and Fabrication
Original Manuscript: April 21, 2008
Revised Manuscript: July 18, 2008
Manuscript Accepted: July 20, 2008
Published: September 9, 2008
Marcel Teschke and Stefan Sinzinger, "Novel approaches to the design of halftone masks for analog lithography," Appl. Opt. 47, 4767-4776 (2008)