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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 47, Iss. 29 — Oct. 10, 2008
  • pp: 5253–5260

Removal of a protective coating on Al by ion etching for high reflectance in the far ultraviolet

Juan I. Larruquert and Ritva A. M. Keski-Kuha  »View Author Affiliations


Applied Optics, Vol. 47, Issue 29, pp. 5253-5260 (2008)
http://dx.doi.org/10.1364/AO.47.005253


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Abstract

The effect of ion etching on the reflectance of Al coatings in the far ultraviolet is investigated. Ion etching of an overlayer grown on Al was performed by applying 100 300 eV Ar + ions using an ion gun. Ion etching was employed to remove the oxide naturally grown on an Al film that had been in contact with atmosphere. Ion etching was also used to remove part or all of the protective Mg F 2 film on Al. The reflectance at 121.6 nm , H Lyman α line of the overlayer-removed Al surface was monitored after protecting it with a Mg F 2 layer. Ion etching on both types of coatings resulted in an excellent reflectance value at 121.6 nm , whereas a reflectance loss was observed at longer wavelengths.

© 2008 Optical Society of America

OCIS Codes
(120.5700) Instrumentation, measurement, and metrology : Reflection
(230.4170) Optical devices : Multilayers
(260.7200) Physical optics : Ultraviolet, extreme
(310.6860) Thin films : Thin films, optical properties
(350.6090) Other areas of optics : Space optics
(310.1515) Thin films : Protective coatings

ToC Category:
Physical Optics

History
Original Manuscript: June 3, 2008
Manuscript Accepted: July 4, 2008
Published: October 1, 2008

Citation
Juan I. Larruquert and Ritva A. M. Keski-Kuha, "Removal of a protective coating on Al by ion etching for high reflectance in the far ultraviolet," Appl. Opt. 47, 5253-5260 (2008)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-47-29-5253


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