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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 47, Iss. 33 — Nov. 20, 2008
  • pp: 6236–6242

Pressure and velocity dependence of the material removal rate in the fast polishing process

Wei Yang, YinBiao Guo, YaGuo Li, and Qiao Xu  »View Author Affiliations


Applied Optics, Vol. 47, Issue 33, pp. 6236-6242 (2008)
http://dx.doi.org/10.1364/AO.47.006236


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Abstract

Based on the direct contact between the wafer and the pad, the pressure and velocity dependence of the material removal rate (MRR) in the fast polishing process (FPP) is investigated. There are three assumptions of the FPP material removal mechanism: the normal distribution of abrasive size, a periodic roughness of the pad surface, and the plastic contact between wafer–abrasive and pad–abrasive interfaces. Based on the particular FPP, a novel movement of the wafer is analyzed and a MRR equation is developed. The experiments with parameters of pressure and velocity are shown to verify the equation. Thus, a better understanding of the fundamental mechanism involved in FPP can be obtained.

© 2008 Optical Society of America

OCIS Codes
(220.0220) Optical design and fabrication : Optical design and fabrication
(220.5450) Optical design and fabrication : Polishing

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: June 26, 2008
Revised Manuscript: October 16, 2008
Manuscript Accepted: October 16, 2008
Published: November 19, 2008

Citation
Wei Yang, YinBiao Guo, YaGuo Li, and Qiao Xu, "Pressure and velocity dependence of the material removal rate in the fast polishing process," Appl. Opt. 47, 6236-6242 (2008)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-47-33-6236


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