Photoembossing is a rapid, low cost process to create surface relief structures in polymer thin films via a reaction/diffusion mechanism. It is demonstrated that this technique can be used to create a microlens array of which the focal length can be easily controlled by tuning the processing parameters. In addition, the technique is shown to be particularly interesting since it does not require any physical contact during the development of the microlens array. Additional coatings (e.g., a solution-processable antireflection coating) can therefore be applied prior to the development of the microlens array when the film is still flat. This stimulates the formation of films with a homogeneous thickness distribution and obviates the use of further postprocessing steps.
© 2008 Optical Society of America
Optical Design and Fabrication
Original Manuscript: July 8, 2008
Revised Manuscript: October 22, 2008
Manuscript Accepted: October 30, 2008
Published: December 3, 2008
Ko Hermans, Shabnam Zaker Hamidi, Anne B. Spoelstra, Cees W. M. Bastiaansen, and Dirk J. Broer, "Rapid, direct fabrication of antireflection-coated microlens arrays by photoembossing," Appl. Opt. 47, 6512-6517 (2008)