Abstract
A deep-etched polarization-independent binary fused-silica phase grating as a three-port beam splitter is designed and manufactured. The grating profile is optimized by use of the rigorous coupled-wave analysis around the wavelength. The physical explanation of the grating is illustrated by the modal method. Simple analytical expressions of the diffraction efficiencies and modal guidelines for the three-port beam splitter grating design are given. Holographic recording technology and inductively coupled plasma etching are used to manufacture the fused-silica grating. Experimental results are in good agreement with the theoretical values.
© 2008 Optical Society of America
Full Article | PDF ArticleMore Like This
Bo Wang, Changhe Zhou, Jijun Feng, Huayi Ru, and Jiangjun Zheng
Appl. Opt. 47(22) 4004-4008 (2008)
Jijun Feng, Changhe Zhou, Jiangjun Zheng, Hongchao Cao, and Peng Lv
Appl. Opt. 48(14) 2697-2701 (2009)
Jijun Feng, Changhe Zhou, Jiangjun Zheng, Hongchao Cao, and Peng Lv
Appl. Opt. 48(29) 5636-5641 (2009)