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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 47, Iss. 35 — Dec. 10, 2008
  • pp: 6638–6643

Three-port beam splitter of a binary fused-silica grating

Jijun Feng, Changhe Zhou, Bo Wang, Jiangjun Zheng, Wei Jia, Hongchao Cao, and Peng Lv  »View Author Affiliations


Applied Optics, Vol. 47, Issue 35, pp. 6638-6643 (2008)
http://dx.doi.org/10.1364/AO.47.006638


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Abstract

A deep-etched polarization-independent binary fused-silica phase grating as a three-port beam splitter is designed and manufactured. The grating profile is optimized by use of the rigorous coupled-wave analysis around the 785 nm wavelength. The physical explanation of the grating is illustrated by the modal method. Simple analytical expressions of the diffraction efficiencies and modal guidelines for the three-port beam splitter grating design are given. Holographic recording technology and inductively coupled plasma etching are used to manufacture the fused-silica grating. Experimental results are in good agreement with the theoretical values.

© 2008 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(050.1960) Diffraction and gratings : Diffraction theory
(220.4000) Optical design and fabrication : Microstructure fabrication
(230.1360) Optical devices : Beam splitters

ToC Category:
Diffraction and Gratings

History
Original Manuscript: July 9, 2008
Revised Manuscript: September 18, 2008
Manuscript Accepted: October 30, 2008
Published: December 8, 2008

Citation
Jijun Feng, Changhe Zhou, Bo Wang, Jiangjun Zheng, Wei Jia, Hongchao Cao, and Peng Lv, "Three-port beam splitter of a binary fused-silica grating," Appl. Opt. 47, 6638-6643 (2008)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-47-35-6638


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