OSA's Digital Library

Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 48, Iss. 1 — Jan. 1, 2009
  • pp: 127–133

Optical properties and microstructure of Ta 2 O 5 biaxial film

Hongji Qi, Xiudi Xiao, Hongbo He, Kui Yi, and Zhengxiu Fan  »View Author Affiliations


Applied Optics, Vol. 48, Issue 1, pp. 127-133 (2009)
http://dx.doi.org/10.1364/AO.48.000127


View Full Text Article

Enhanced HTML    Acrobat PDF (626 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

This study investigates the optical properties and microstructure of Ta 2 O 5 film deposited with the glancing angle deposition technique. The tilted nanocolumn microstructure, examined with scanning electron microscopy, induces the optical anisotropy of thin film. The optical properties of thin film are characterized with an inverse synthesis method. Based on the Cauchy model, the dispersion equations of optical constants of film are determined from the transmittance spectra measured at normal and oblique incidence over 400 800 nm . The starting values derived with an envelope method quicken the optimization process greatly. The dispersion of the principal indices N 1 , N 2 , and N 3 and the thickness d of thin film are presented statistically. A good agreement between the measured optical properties and theoretical calculation is obtained, which validates the model established for thin film produced by glancing angle deposition.

© 2008 Optical Society of America

OCIS Codes
(120.4530) Instrumentation, measurement, and metrology : Optical constants
(230.4000) Optical devices : Microstructure fabrication
(260.1440) Physical optics : Birefringence
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Optical Devices

History
Original Manuscript: September 17, 2008
Revised Manuscript: November 25, 2008
Manuscript Accepted: November 27, 2008
Published: December 22, 2008

Citation
Hongji Qi, Xiudi Xiao, Hongbo He, Kui Yi, and Zhengxiu Fan, "Optical properties and microstructure of Ta2O5 biaxial film," Appl. Opt. 48, 127-133 (2009)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-48-1-127


Sort:  Author  |  Year  |  Journal  |  Reset  

References

  1. A. J. Waldorf, J. A. Dobrowolski, B. T. Sullivan, and L. M. Plante, “Optical coatings deposited by reactive ion plating,” Appl. Opt. 32, 5583-5593 (1993). [CrossRef] [PubMed]
  2. W. M. Paulson, F. S. Hickernell, and R. L. Davis, “Effects of deposition parameters on optical loss for RF-sputtered Ta2O5 and Si3N4 waveguides,” J. Vac. Sci. Technol. 16, 307-310 (1979). [CrossRef]
  3. P. C. Joshi and M. W. Cole, “Influence of postedeposition annealing on the enhanced structural and electrical properties of amorphous and crystalline Ta2O5 thin films for dynamic random access memory applications,” J. Appl. Phys. 86, 871-880 (1999). [CrossRef]
  4. C. Chaneliere, S. Four, J. L. Autran, R. A. B. Devine, and N. P. Sandler, “Properties of amorphous and crystalline Ta2O5 thin films deposited on Si from Ta(OC2H5)5 precursor,” J. Appl. Phys. 83, 4823-4829 (1998). [CrossRef]
  5. S. Ezhilvalavan and T. Y. Tseng, “Preparation and properties of tantalum pentoxide (Ta2O5) thin films for ultra large scale integrated circuits (ULSIs) application-A review,” J. Mater. Sci.: Mater. Electron. 10, 9-31 (1999). [CrossRef]
  6. C. Chaneliere, J. L. Autran, R. A. B. Devine, and B. Balland, “Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications,” Mater. Sci. Eng. R22, 269-322 (1998).
  7. E. Franke, M. Schubert, C. L. Trimble, M. J. DeVries, and J. A. Woollam, “Optical properties of amorphous and polycrystalline tantalum oxide thin films measured by spectroscopic ellipsometry from 0.03 to 8.5 eV,” Thin Solid Films 388, 283-289 (2001). [CrossRef]
  8. M. H. Asghar, F. Placido, and S. Naseem, “Characterization of Ta2O5 thin films prepared by reactive evaporation,” Eur. Phys. J. Appl. Phys. 36, 119-124 (2006). [CrossRef]
  9. K. Robbie, M. J. Brett, and A. Lakhtakia, “Chiral sculptured thin films,” Nature 384, 616-616 (1996). [CrossRef]
  10. R. Messier, T. Gehrke, C. Frankel, V. C. Venugopal, W. Otano, and A. Lahktakia, “Engineered sculptured nematic thin films,” J. Vac. Sci. Technol. A 15, 2148-2152 (1997). [CrossRef]
  11. K. Robbie and M. J. Brett, “Sculptured thin films and glancing angle deposition: growth mechanics and applications,” J. Vac. Sci. Technol. A 15, 1460-1465 (1997). [CrossRef]
  12. A. C. van Popta, M. J. Brett, and J. C. Sit, “Double-handed circular Bragg phenomena in polygonal helix thin films,” J. Appl. Phys. 98, 083517 (2005). [CrossRef]
  13. R. Messier, V. C. Venugopal, and P. D. Sunal, “Origin and evolution of sculptured thin films,” J. Vac. Sci. Technol. A 18, 1538-1545 (2000). [CrossRef]
  14. Y. J. Jen, C. Y. Peng, and H. H. Chang, “Optical constant determination of an anisotropic thin film via polarization conversion,” Opt. Express 15, 4445-4451 (2007). [CrossRef] [PubMed]
  15. I. J. Hodgkinson, Q. H. Wu, L. D. Silva, and M. Arnold, “Inorganic positive uniaxial films fabricated by serial bideposition,” Opt. Express 12, 3840-3847 (2004). [CrossRef] [PubMed]
  16. T. Motohiro and Y. Taga, “Thin film retardation plate by oblique deposition,” Appl. Opt. 28, 2466-2482 (1989). [CrossRef] [PubMed]
  17. K. Shiraishi and K. Matsumura, “Fabrication of spatial walk-off polarizing films by oblique deposition,” IEEE J. Quantum Electron. 30, 2417-2420 (1994). [CrossRef]
  18. I. J. Hodgkinson, Q. H. Wu, and J. Hazel, “Empirical equations for the principal refractive indices and column angle of obliquely deposited films of tantalum oxide, titanium oxide, and zirconium oxide,” Appl. Opt. 37, 2653-2659 (1998). [CrossRef]
  19. E. Pelletier, F. Flory, and Y. Hu, “Optical characterization of thin films by guided waves,” Appl. Opt. 28, 2918-2924 (1989). [CrossRef] [PubMed]
  20. G. Zhang and K. Sasaki, “Measuring anisotropic refractive indices and film thicknesses of thin organic crystals using the prism coupling method,” Appl. Opt. 27, 1358-1362 (1988). [CrossRef] [PubMed]
  21. H. M. Wang, “Determination of refractive indices and thickness of absorbing crystalline thin films by using prism coupler,” Fiber Integr. Opt. 13, 293-308 (1994). [CrossRef]
  22. H. Jänchen, D. Endelema, N. Kaiser, and F. Flory, “Determination of the refractive indices of highly biaxial anisotropic coatings using guided modes,” Pure Appl. Opt. 5, 405-415(1996). [CrossRef]
  23. H. M. Wang, “Analysis of anisotropic thin film parameters from prism coupler measurements,” J. Mod. Opt. 42, 2173-2181 (1995). [CrossRef]
  24. F. Flory, D. Endelema, E. Pelletier, and I. J. Hodgkinson, “Anisotropy in thin films: modeling and measurement of guided and nonguided optical properties: application to TiO2 films,” Appl. Opt. 32, 5649-5659 (1993). [CrossRef] [PubMed]
  25. Y. J. Jen, C. H. Hsieh, and T. S. Lo, “Optical constant determination of an anisotropic thin film via surface plasmon resonance: analyzed by sensitivity calculation,” Opt. Commun. 244, 269-277 (2005). [CrossRef]
  26. M. Schubert and W. Dollase, “Generalized ellipsometry for biaxial absorbing materials: determination of crystal orientation and optical constants of Sb2S3,” Opt. Lett. 27, 2073-2075 (2002). [CrossRef]
  27. I. J. Hodgkinson, J. C. Hazel, and Q. H. Wu, “In situ measurement of principal refractive indices of thin films by two-angle ellipsometry,” Thin Solid Films 313-314, 368-372 (1998). [CrossRef]
  28. B. Lecourt, D. Blaudez, and J. M. Turlet, “Anisotropy in Langmuir-Blodgett films studied by generalized spectroscopic ellipsometry,” Thin Solid Films 313-314, 790-794 (1998). [CrossRef]
  29. J. Gospodyn and J. C. Sit, “Characterization of dielectric columnar thin films by variable angle Mueller matrix and spectroscopic ellipsometry,” Opt. Mater. 29, 318-325 (2006). [CrossRef]
  30. I. J. Hodgkinson, F. Horowitz, H. A. Macleod, M. Sikkens, and J. J. Wharton, “Measurement of the principal refractive indices of thin films deposited at oblique incidence,” J. Opt. Soc. Am. A 2, 1693-1697 (1985). [CrossRef]
  31. I. J. Hodgkinson and Q. H. Wu, “Vacuum deposited biaxial thin films with all principal axes inclined to the substrate,” J. Vac. Sci. Technol. A 17, 2928-2932 (1999). [CrossRef]
  32. X. D. Xiao, G. P. Dong, H. J. Qi, Z. X. Fan, H. B. He, and J. D. Shao, “Effects of annealing on microstructure and optical properties of TiO2 sculptured thin films,” Chin. Phys. Lett. 25, 2181-2184 (2008). [CrossRef]
  33. H. A. Macleod, in Thin Film Filters, 3rd, ed., W. T. Welford and S. Laurenson, eds. (Institute of Physics, 2001), pp. 12-50. [CrossRef]
  34. H. J. Qi, D. P. Zhang, J. D. Shao, and Z. X. Fan, “Matrix analysis of an anisotropic optical thin film,” Europhys. Lett. 70, 257-266 (2005). [CrossRef]
  35. H. J. Qi, J. D. Shao, and Z. X. Fan, “Analysis of characteristic matrix for a uniaxially birefringent thin film,” Europhys. Lett. 78, 17004 (2007). [CrossRef]

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.


« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited