OSA's Digital Library

Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 48, Iss. 1 — Jan. 1, 2009
  • pp: 69–73

Surface profile control of the autocloned photonic crystal by ion-beam-sputter deposition with radio-frequency-bias etching

Chen Yang Huang, Hao Min Ku, and Shiuh Chao  »View Author Affiliations

Applied Optics, Vol. 48, Issue 1, pp. 69-73 (2009)

View Full Text Article

Enhanced HTML    Acrobat PDF (695 KB)

Browse Journals / Lookup Meetings

Browse by Journal and Year


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools



Growth of the autocloned Ta 2 O 5 / Si O 2 multilayer photonic crystal with a lateral sawtooth period was simulated. Ion-beam sputter (IBS) was applied to deposit the films and radio-frequency-bias (RF-bias) etching was applied simultaneously with the IBS on the Ta 2 O 5 film. Both simulation and experiment showed that the quality of the autocloning can be controlled by the RF-bias power; there is an intermediate power range within which the drop of peak-to-valley height variation of the sawtooth profile can be reduced significantly such that a high degree of autocloning can be achieved. Analysis showed that simultaneous deposition and etching at the proper RF-bias power on the Ta 2 O 5 film has the capability to compensate the flattening effect of the Si O 2 deposition such that the sawtooth surface profile can be maintained.

© 2008 Optical Society of America

OCIS Codes
(310.6870) Thin films : Thin films, other properties
(160.5298) Materials : Photonic crystals
(310.6628) Thin films : Subwavelength structures, nanostructures

ToC Category:
Thin Films

Original Manuscript: September 5, 2008
Revised Manuscript: October 31, 2008
Manuscript Accepted: November 3, 2008
Published: December 18, 2008

Chen Yang Huang, Hao Min Ku, and Shiuh Chao, "Surface profile control of the autocloned photonic crystal by ion-beam-sputter deposition with radio-frequency-bias etching," Appl. Opt. 48, 69-73 (2009)

Sort:  Author  |  Year  |  Journal  |  Reset  


  1. S. Kawakami, “Fabrication of submicrometer 3D period structures composed of Si/SiO2,” Electron. Lett. 33, 1260-1261(1997). [CrossRef]
  2. Y. Ohtera, T. Sato, T. Kawashima, T. Tamamura, and S. Kawakami, “Photonic crystal polarization splitters,” Electron. Lett. 35, 1271 (1999). [CrossRef]
  3. S. Kawakami, T. Kawashima, and T. Sato, “Mechanism of shape formation of three-dimensional periodic nanostructures by bias sputtering,” Appl. Phys Lett. 74, 463-465(1999). [CrossRef]
  4. T. Kawashima, K. Miura, T. Sato, and S. Kawakami, “Self-healing effects in the fabrication process of photonic crystals,” Appl. Phys Lett. 77, 2613-2615(2000). [CrossRef]
  5. C. Y. Ting, V. J. Vivalda, and H. G. Schaefer, “Study of planarized sputter-deposited SiO2,” J. Vac. Sci. Technol. 15, 1105-1112 (1978). [CrossRef]
  6. H. Bach, “Application of ion sputtering in preparing glasses and their surface layers for electron microscope investigations,” J. Non-Cryst. Solids 3, 1-32 (1970). [CrossRef]
  7. S. Matsuo, “An analytical treatment on the pattern formation process by sputter etching with a mask,” Jpn. J. Appl. Phys. 15, 1253-1562 (1976). [CrossRef]
  8. A. Bubenzer, B. Dischler, G. Brandt, and P. Koidl, “rf-plasma deposited amorphous hydrogenated hard carbon thin films: Preparation, properties, and applications,” J. Appl. Phys. 54, 4590-4595 (1983). [CrossRef]
  9. Y. Catherine and P. Couderc, “Electrical characteristics and growth kinetics in discharges used for plasma deposition of amorphouse carbon,” Thin Solid Films 144, 265-280 (1986). [CrossRef]

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited