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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 48, Iss. 1 — Jan. 1, 2009
  • pp: 69–73

Surface profile control of the autocloned photonic crystal by ion-beam-sputter deposition with radio-frequency-bias etching

Chen Yang Huang, Hao Min Ku, and Shiuh Chao  »View Author Affiliations


Applied Optics, Vol. 48, Issue 1, pp. 69-73 (2009)
http://dx.doi.org/10.1364/AO.48.000069


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Abstract

Growth of the autocloned Ta 2 O 5 / Si O 2 multilayer photonic crystal with a lateral sawtooth period was simulated. Ion-beam sputter (IBS) was applied to deposit the films and radio-frequency-bias (RF-bias) etching was applied simultaneously with the IBS on the Ta 2 O 5 film. Both simulation and experiment showed that the quality of the autocloning can be controlled by the RF-bias power; there is an intermediate power range within which the drop of peak-to-valley height variation of the sawtooth profile can be reduced significantly such that a high degree of autocloning can be achieved. Analysis showed that simultaneous deposition and etching at the proper RF-bias power on the Ta 2 O 5 film has the capability to compensate the flattening effect of the Si O 2 deposition such that the sawtooth surface profile can be maintained.

© 2008 Optical Society of America

OCIS Codes
(310.6870) Thin films : Thin films, other properties
(160.5298) Materials : Photonic crystals
(310.6628) Thin films : Subwavelength structures, nanostructures

ToC Category:
Thin Films

History
Original Manuscript: September 5, 2008
Revised Manuscript: October 31, 2008
Manuscript Accepted: November 3, 2008
Published: December 18, 2008

Citation
Chen Yang Huang, Hao Min Ku, and Shiuh Chao, "Surface profile control of the autocloned photonic crystal by ion-beam-sputter deposition with radio-frequency-bias etching," Appl. Opt. 48, 69-73 (2009)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-48-1-69

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