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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 48, Iss. 17 — Jun. 10, 2009
  • pp: 3139–3143

Determining thickness of films on a curved substrate by use of ellipsometric measurements

Chien-Yuan Han, Zhen-You Lee, and Yu-Faye Chao  »View Author Affiliations


Applied Optics, Vol. 48, Issue 17, pp. 3139-3143 (2009)
http://dx.doi.org/10.1364/AO.48.003139


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Abstract

A three-intensity measurement technique has been employed in polarizer–sample–analyzer imaging ellipsometry to measure the two-dimensional ellipsometric parameters of a coated cylindrical lens. Since azimuth deviation α of a polarizer can also be measured with this three-intensity measurement technique, we tilted a well-calibrated thin-film wafer to identify the orientation of the measured α with respect to the incident plane. Using the analytic property of this measurement technique, we can correct the deviation and determine the thickness profile of the thin film coated on a cylindrical lens.

© 2009 Optical Society of America

OCIS Codes
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry
(310.6870) Thin films : Thin films, other properties

ToC Category:
Ellipsometry and Polarimetry

History
Original Manuscript: January 2, 2009
Revised Manuscript: May 6, 2009
Manuscript Accepted: May 8, 2009
Published: June 1, 2009

Citation
Chien-Yuan Han, Zhen-You Lee, and Yu-Faye Chao, "Determining thickness of films on a curved substrate by use of ellipsometric measurements," Appl. Opt. 48, 3139-3143 (2009)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-48-17-3139


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References

  1. R. M. A. Azzam and N. M. Bashara, Ellipsometry and Polarized Light (North-Holland, 1992), Chap. 4, p. 274.
  2. C. L. Tien, C. C. Lee, and C. C. Jaing,” The measurement of thin film stress using phase shifting interferometry,” J. Mod. Opt. 47, 839-849 (2000).
  3. Y. F. Chao, C. S. Wei, W. C. Lee, S. C. Lin, and T. S. Chao,” Ellipsometric measurements and its alignment: using the intensity ratio technique,” Jpn. J. Appl. Phys. 34, 5016-5019(1995). [CrossRef]
  4. Y. F. Chao and K. Y. Lee, “Index profile of radial gradient index lens measured by imaging ellipsometric technique,” Jpn. J. Appl. Phys. 44, 1111-1114 (2005). [CrossRef]
  5. K. Y. Lee and Y. F. Chao, “The ellipsometric measurements of a curved surface,” Jpn. J. Appl. Phys. 44, L1015-L1018 (2005). [CrossRef]
  6. Y. F. Chao, K. Y. Lee, and Y. D. Lin,” Analytical solutions of the azimuthal deviation of a polarizer and an analyzer by polarizer-sample-analyzer ellipsometry,” Appl. Opt. 45, 3935-3939 (2006). [CrossRef] [PubMed]
  7. E. Meyer, H. Frede and H. Knof, “Optical effects in metals: application of a least-squares method to measurements on gold and silver,” J. Appl. Phys. 38, 3682-3684 (1967). [CrossRef]

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