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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 48, Iss. 17 — Jun. 10, 2009
  • pp: 3139–3143

Determining thickness of films on a curved substrate by use of ellipsometric measurements

Chien-Yuan Han, Zhen-You Lee, and Yu-Faye Chao  »View Author Affiliations

Applied Optics, Vol. 48, Issue 17, pp. 3139-3143 (2009)

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A three-intensity measurement technique has been employed in polarizer–sample–analyzer imaging ellipsometry to measure the two-dimensional ellipsometric parameters of a coated cylindrical lens. Since azimuth deviation α of a polarizer can also be measured with this three-intensity measurement technique, we tilted a well-calibrated thin-film wafer to identify the orientation of the measured α with respect to the incident plane. Using the analytic property of this measurement technique, we can correct the deviation and determine the thickness profile of the thin film coated on a cylindrical lens.

© 2009 Optical Society of America

OCIS Codes
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry
(310.6870) Thin films : Thin films, other properties

ToC Category:
Ellipsometry and Polarimetry

Original Manuscript: January 2, 2009
Revised Manuscript: May 6, 2009
Manuscript Accepted: May 8, 2009
Published: June 1, 2009

Chien-Yuan Han, Zhen-You Lee, and Yu-Faye Chao, "Determining thickness of films on a curved substrate by use of ellipsometric measurements," Appl. Opt. 48, 3139-3143 (2009)

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