OSA's Digital Library

Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 48, Iss. 18 — Jun. 20, 2009
  • pp: 3277–3283

Non-turning-point monitoring improves narrow bandpass filters

Ronald R. Willey  »View Author Affiliations

Applied Optics, Vol. 48, Issue 18, pp. 3277-3283 (2009)

View Full Text Article

Enhanced HTML    Acrobat PDF (1495 KB)

Browse Journals / Lookup Meetings

Browse by Journal and Year


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools



Historic practice has been to optically monitor narrow bandpass filters by the termination of each layer at a turning point. The problem is that turning points are the least sensitive points to the change of the optical signal with thickness and, thereby, those points are most prone to errors. It is shown that better performance in the production results can be achieved by designing and monitoring in order to terminate layers at non-turning points. A further advantage has been discovered wherein nonoptical monitoring of some layers is used to achieve even better stability in the production result. Simulation programs have been applied to such designs and demonstrate the advantages as compared to the historical approach.

© 2009 Optical Society of America

OCIS Codes
(310.0310) Thin films : Thin films
(310.1860) Thin films : Deposition and fabrication
(310.4165) Thin films : Multilayer design
(310.6805) Thin films : Theory and design

ToC Category:
Thin Films

Original Manuscript: March 3, 2009
Revised Manuscript: May 22, 2009
Manuscript Accepted: May 22, 2009
Published: June 10, 2009

Ronald R. Willey, "Non-turning-point monitoring improves narrow bandpass filters," Appl. Opt. 48, 3277-3283 (2009)

Sort:  Author  |  Year  |  Journal  |  Reset  


  1. H. A. Macleod, “Turning value monitoring of narrow-band all-dielectric thin-film optical filters,” Opt. Acta 19, 1-28 (1972). [CrossRef]
  2. P. Bousquet, A. Fornier, R. Kowalczyk, E. Pelletier, and P. Roche, “Optical filters: monitoring process allowing the auto-correction of thickness errors,” Thin Solid Films 13, 285-290 (1972). [CrossRef]
  3. C. Schroedter, “Evaporation monitoring system featuring software trigger points and on-line evaluation of refractive indices,” Proc. SPIE 652, 15-20 (1986).
  4. R. R. Willey, “Monitoring thin films of the fence post design and its advantages for narrow bandpass filters,” Appl. Opt. 47, C147-C150 (2008). [CrossRef] [PubMed]
  5. R. R. Willey, “Design and monitoring of narrow bandpass filters composed of non-quarter-wave thicknesses,” Proc. SPIE 7101, 710119 (2008). [CrossRef]
  6. A. Zöller, M. Boos, H. Hagedorn, and B. Romanov, “Computer simulation of coating processes with monochromatic monitoring,” Proc. SPIE 7101, 71010G (2008). [CrossRef]
  7. R. R. Willey and A. Zöller, “Computer simulation of monitoring of narrow bandpass filter sat non-turning points,” in 52nd Annual Technical Conference Proceedings of the Society of Vacuum Coaters (Society of Vacuum Coaters, 2009), paper O-7.

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.

Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited