Correlation method for the measure of mask-induced line-edge roughness in extreme ultraviolet lithography
Applied Optics, Vol. 48, Issue 18, pp. 3302-3307 (2009)
http://dx.doi.org/10.1364/AO.48.003302
Enhanced HTML 
Acrobat PDF (904 KB)
Abstract
As critical dimensions for leading-edge semiconductor devices shrink, the line-edge roughness (LER) requirements are pushing well into the single digit nanometer regime. At these scales many new sources of LER must be considered. In the case of extreme ultraviolet (EUV) lithography, modeling has shown the lithographic mask to be a source of significant concern. Here we present a correlation-based methodology for experimentally measuring the magnitude of mask contributors to printed LER. The method is applied to recent printing results from a 0.3 numerical aperture EUV microfield exposure tool. The measurements demonstrate that such effects are indeed present and of significant magnitude. The method is also used to explore the effects of illumination coherence and defocus and has been used to verify model-based predictions of mask-induced LER.
© 2009 Optical Society of America
OCIS Codes
(030.6140) Coherence and statistical optics : Speckle
(110.3960) Imaging systems : Microlithography
ToC Category:
Imaging Systems
History
Original Manuscript: March 20, 2009
Revised Manuscript: May 18, 2009
Manuscript Accepted: May 25, 2009
Published: June 10, 2009
Citation
Patrick P. Naulleau, "Correlation method for the measure of mask-induced line-edge roughness in extreme ultraviolet lithography," Appl. Opt. 48, 3302-3307 (2009)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-48-18-3302
You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
Related Journal Articles 
- Statistics and reduction of speckle in optical coherence tomography (OL)
- Spectrally resolved Michelson stellar interferometry. I. Exact formalism in the multispeckle mode (JOSAA)
- Statistical properties of triple-random-modulated dynamic speckles (JOSAA)
- Relevance of Mask-Roughness-Induced Printed Line-Edge Roughness in Recent and Future Extreme-Ultraviolet Lithography Tests (AO)
- Effect of mask-roughness on printed contact-size variation in extreme-ultraviolet lithography (AO)
Related Conference Papers
- Polarized Temporal Impulse Responses for Scattering Media from Speckle Frequency Correlations
- Near-Field Measurements of the Speckle Pattern for Diffusive and Localized Waves in Random Media
- Spatial and temporal coherence characterization of a smoothed laser beam
- Study of scattering media with polarized coherent light
- Photon localization in the time domain
« Previous Article | Next Article »
OSA is a member of 