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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 48, Iss. 19 — Jul. 1, 2009
  • pp: 3654–3663

Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations

Zicheng Qiu, Xiangzhao Wang, Qunyu Bi, Qiongyan Yuan, Bo Peng, and Lifeng Duan  »View Author Affiliations

Applied Optics, Vol. 48, Issue 19, pp. 3654-3663 (2009)

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A linear measurement model of lithographic projection lens aberrations is studied numerically based on the Hopkins theory of partially-coherent imaging and positive resist optical lithography (PROLITH) simulation. In this linearity model, the correlation between the mark’s structure and its sensitivities to aberrations is analyzed. A method to design a mark with high sensitivity is proved and declared. By use of this method, a translational-symmetry alternating phase shifting mask (Alt-PSM) grating mark is redesigned with all of the even orders, ± 3 rd and ± 5 th order diffraction light missing. In the evaluation simulation, the measurement accuracies of aberrations prove to be enhanced apparently by use of the redesigned mark instead of the old ones.

© 2009 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(110.3960) Imaging systems : Microlithography
(110.4980) Imaging systems : Partial coherence in imaging
(110.5220) Imaging systems : Photolithography
(120.3940) Instrumentation, measurement, and metrology : Metrology

ToC Category:
Imaging Systems

Original Manuscript: April 6, 2009
Manuscript Accepted: May 25, 2009
Published: June 22, 2009

Zicheng Qiu, Xiangzhao Wang, Qunyu Bi, Qiongyan Yuan, Bo Peng, and Lifeng Duan, "Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations," Appl. Opt. 48, 3654-3663 (2009)

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