Masking technique for coating thickness control on large and strongly curved aspherical optics
Applied Optics, Vol. 48, Issue 19, pp. 3760-3765 (2009)
http://dx.doi.org/10.1364/AO.48.003760
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Abstract
We discuss a method to control the coating thickness deposited onto large and strongly curved optics by ion beam sputtering. The technique uses an original design of the mask used to screen part of the sputtered materials. A first multielement mask is calculated from the measured two-dimensional coating thickness distribution. Then, by means of an iterative process, the final mask is designed. By using such a technique, it has been possible to deposit layers of tantalum pentoxide having a high thickness gradient onto a curved substrate
© 2009 Optical Society of America
OCIS Codes
(220.4610) Optical design and fabrication : Optical fabrication
(310.0310) Thin films : Thin films
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
ToC Category:
Optical Design and Fabrication
History
Original Manuscript: February 12, 2009
Revised Manuscript: May 29, 2009
Manuscript Accepted: May 29, 2009
Published: June 24, 2009
Citation
B. Sassolas, R. Flaminio, J. Franc, C. Michel, J.-L. Montorio, N. Morgado, and L. Pinard, "Masking technique for coating thickness control on large and strongly curved aspherical optics," Appl. Opt. 48, 3760-3765 (2009)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-48-19-3760
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