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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 48, Iss. 2 — Jan. 10, 2009
  • pp: 355–364

Direct measurement of absorption-induced wavefront distortion in high optical power systems

Aidan F. Brooks, David Hosken, Jesper Munch, Peter J. Veitch, Zewu Yan, Chunnong Zhao, Yaohui Fan, Li Ju, David Blair, Phil Willems, Bram Slagmolen, and Jerome Degallaix  »View Author Affiliations


Applied Optics, Vol. 48, Issue 2, pp. 355-364 (2009)
http://dx.doi.org/10.1364/AO.48.000355


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Abstract

Wavefront distortion due to absorption in the substrates and coatings of mirrors in advanced gravitational wave interferometers has the potential to compromise the operation and sensitivity of these interferometers [ Opt. Lett. 29, 2635–2637 (2004)]. We report the first direct spatially-resolved measurement, to our knowledge, of such wavefront distortion in a high optical power cavity. The measurement was made using an ultrahigh sensitivity Hartmann wavefront sensor on a dedicated test facility. The sensitivity of the sensor was λ / 730 , where λ = 800 nm .

© 2009 Optical Society of America

OCIS Codes
(120.2230) Instrumentation, measurement, and metrology : Fabry-Perot
(350.6830) Other areas of optics : Thermal lensing
(280.4788) Remote sensing and sensors : Optical sensing and sensors

ToC Category:
Instrumentation, Measurement, and Metrology

History
Original Manuscript: October 10, 2008
Manuscript Accepted: November 21, 2008
Published: January 7, 2009

Citation
Aidan F. Brooks, David Hosken, Jesper Munch, Peter J. Veitch, Zewu Yan, Chunnong Zhao, Yaohui Fan, Li Ju, David Blair, Phil Willems, Bram Slagmolen, and Jerome Degallaix, "Direct measurement of absorption-induced wavefront distortion in high optical power systems," Appl. Opt. 48, 355-364 (2009)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-48-2-355

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