Direct measurement of absorption-induced wavefront distortion in high optical power systems
Applied Optics, Vol. 48, Issue 2, pp. 355-364 (2009)
http://dx.doi.org/10.1364/AO.48.000355
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Abstract
Wavefront distortion due to absorption in the substrates and coatings of mirrors in
advanced gravitational wave interferometers has the potential to compromise the
operation and sensitivity of these interferometers [
Opt. Lett.
29, 2635–2637
(2004)]. We report the first
direct spatially-resolved measurement, to our knowledge, of such wavefront distortion
in a high optical power cavity. The measurement was made using an ultrahigh
sensitivity Hartmann wavefront sensor on a dedicated test facility. The sensitivity
of the sensor was
© 2009 Optical Society of America
OCIS Codes
(120.2230) Instrumentation, measurement, and metrology : Fabry-Perot
(350.6830) Other areas of optics : Thermal lensing
(280.4788) Remote sensing and sensors : Optical sensing and sensors
ToC Category:
Instrumentation, Measurement, and Metrology
History
Original Manuscript: October 10, 2008
Manuscript Accepted: November 21, 2008
Published: January 7, 2009
Citation
Aidan F. Brooks, David Hosken, Jesper Munch, Peter J. Veitch, Zewu Yan, Chunnong Zhao, Yaohui Fan, Li Ju, David Blair, Phil Willems, Bram Slagmolen, and Jerome Degallaix, "Direct measurement of absorption-induced wavefront distortion in high optical power systems," Appl. Opt. 48, 355-364 (2009)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-48-2-355
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