Performance, structure, and stability of SiC/Al multilayer films for extreme ultraviolet applications
Applied Optics, Vol. 48, Issue 26, pp. 4932-4941 (2009)
http://dx.doi.org/10.1364/AO.48.004932
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Abstract
We report on the performance, structure and stability of periodic multilayer films containing silicon carbide (SiC) and aluminum (Al) layers designed for use as reflective coatings in the extreme ultraviolet (EUV). We find that SiC/Al multilayers prepared by magnetron sputtering have low stress, good temporal and thermal stability, and provide good performance in the EUV, particularly for applications requiring a narrow spectral bandpass, such as monochromatic solar imaging. Transmission electron microscopy reveals amorphous SiC layers and polycrystalline Al layers having a strong
© 2009 Optical Society of America
OCIS Codes
(230.4170) Optical devices : Multilayers
(310.1620) Thin films : Interference coatings
(310.6860) Thin films : Thin films, optical properties
(340.0340) X-ray optics : X-ray optics
(350.1260) Other areas of optics : Astronomical optics
ToC Category:
Optical Devices
History
Original Manuscript: July 14, 2009
Manuscript Accepted: August 8, 2009
Published: September 1, 2009
Citation
David L. Windt and Jeffrey A. Bellotti, "Performance, structure, and stability of SiC/Al multilayer films for extreme ultraviolet applications," Appl. Opt. 48, 4932-4941 (2009)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-48-26-4932
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