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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 48, Iss. 26 — Sep. 10, 2009
  • pp: 4932–4941

Performance, structure, and stability of SiC/Al multilayer films for extreme ultraviolet applications

David L. Windt and Jeffrey A. Bellotti  »View Author Affiliations


Applied Optics, Vol. 48, Issue 26, pp. 4932-4941 (2009)
http://dx.doi.org/10.1364/AO.48.004932


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Abstract

We report on the performance, structure and stability of periodic multilayer films containing silicon carbide (SiC) and aluminum (Al) layers designed for use as reflective coatings in the extreme ultraviolet (EUV). We find that SiC/Al multilayers prepared by magnetron sputtering have low stress, good temporal and thermal stability, and provide good performance in the EUV, particularly for applications requiring a narrow spectral bandpass, such as monochromatic solar imaging. Transmission electron microscopy reveals amorphous SiC layers and polycrystalline Al layers having a strong 111 texture, and relatively large roughness associated with the Al crystallites. Fits to EUV reflectance measurements also indicate large interface widths, consistent with the electron microscopy results. SiC/Al multilayers deposited by reactive sputtering with nitrogen comprise Al layers that are nearly amorphous and consid erably smoother than films deposited nonreactively, but no improvements in EUV reflectance were obtained.

© 2009 Optical Society of America

OCIS Codes
(230.4170) Optical devices : Multilayers
(310.1620) Thin films : Interference coatings
(310.6860) Thin films : Thin films, optical properties
(340.0340) X-ray optics : X-ray optics
(350.1260) Other areas of optics : Astronomical optics

ToC Category:
Optical Devices

History
Original Manuscript: July 14, 2009
Manuscript Accepted: August 8, 2009
Published: September 1, 2009

Citation
David L. Windt and Jeffrey A. Bellotti, "Performance, structure, and stability of SiC/Al multilayer films for extreme ultraviolet applications," Appl. Opt. 48, 4932-4941 (2009)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-48-26-4932

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