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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 48, Iss. 26 — Sep. 10, 2009
  • pp: 4996–5004

Spectroscopic ellipsometry analysis of silicon nanotips obtained by electron cyclotron resonance plasma etching

Arturo Mendoza-Galván, Kenneth Järrendahl, Hans Arwin, Yi-Fan Huang, Li-Chyong Chen, and Kuei-Hsien Chen  »View Author Affiliations


Applied Optics, Vol. 48, Issue 26, pp. 4996-5004 (2009)
http://dx.doi.org/10.1364/AO.48.004996


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Abstract

Silicon nanotips fabricated by electron cyclotron resonance plasma etching of silicon wafers are studied by spectroscopic ellipsometry. The structure of the nanotips is composed of columns 100 140 nm wide and spaced by about 200 nm . Ellipsometry data covering a wide spectral range from the midinfrared to the visible are described by modeling the nanotip layer as a graded uniaxial film using the Bruggeman effective medium approximation. The ellipsometry data in the infrared range reveal two absorption bands at 754 and 955 cm 1 , which cannot be resolved with transmittance measurements. These bands indicate that the etching process is accompanied with formation of carbonaceous SiC and CH n species that largely modify the composition of the original crystalline silicon material affecting the optical response of the nanotips.

© 2009 Optical Society of America

OCIS Codes
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry
(310.3840) Thin films : Materials and process characterization
(160.1245) Materials : Artificially engineered materials
(260.2065) Physical optics : Effective medium theory

ToC Category:
Instrumentation, Measurement, and Metrology

History
Original Manuscript: April 23, 2009
Revised Manuscript: August 3, 2009
Manuscript Accepted: August 24, 2009
Published: September 3, 2009

Citation
Arturo Mendoza-Galván, Kenneth Järrendahl, Hans Arwin, Yi-Fan Huang, Li-Chyong Chen, and Kuei-Hsien Chen, "Spectroscopic ellipsometry analysis of silicon nanotips obtained by electron cyclotron resonance plasma etching," Appl. Opt. 48, 4996-5004 (2009)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-48-26-4996


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