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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 48, Iss. 27 — Sep. 20, 2009
  • pp: 5105–5113

High-efficiency diffractive beam splitters surface-structured on submicrometer scale using deep-UV interference lithography

Jun Amako, Daisuke Sawaki, and Eiichi Fujii  »View Author Affiliations


Applied Optics, Vol. 48, Issue 27, pp. 5105-5113 (2009)
http://dx.doi.org/10.1364/AO.48.005105


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Abstract

We report highly efficient diffractive beam splitters intended for high-power laser applications. Submicron relief structures that work as an antireflective layer are formed on the surfaces of a splitter to improve its transmitted efficiency. Surface structuring is performed using deep-UV interference lithography and reactive ion etching. As immersed in an index-matching liquid, the resist layer coated on diffractive surfaces is exposed to the interference fringes that are set intersecting the grooves on the surfaces. Rigorously designed structures with a period of 140 nm and a depth of 55 nm are lithographed onto fused-silica splitters. Splitting efficiencies at 266 nm are increased by 8% to compare favorably with a theoretical value, while Fresnel reflections are considerably reduced.

© 2009 Optical Society of America

OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(230.1360) Optical devices : Beam splitters
(220.4241) Optical design and fabrication : Nanostructure fabrication
(050.6624) Diffraction and gratings : Subwavelength structures

ToC Category:
Diffraction and Gratings

History
Original Manuscript: June 15, 2009
Revised Manuscript: August 21, 2009
Manuscript Accepted: August 22, 2009
Published: September 10, 2009

Citation
Jun Amako, Daisuke Sawaki, and Eiichi Fujii, "High-efficiency diffractive beam splitters surface-structured on submicrometer scale using deep-UV interference lithography," Appl. Opt. 48, 5105-5113 (2009)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-48-27-5105

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