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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 48, Iss. 28 — Oct. 1, 2009
  • pp: 5407–5412

Optical properties of Al 2 O 3 thin films grown by atomic layer deposition

Pradeep Kumar, Monika K. Wiedmann, Charles H. Winter, and Ivan Avrutsky  »View Author Affiliations

Applied Optics, Vol. 48, Issue 28, pp. 5407-5412 (2009)

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We employed the atomic layer deposition technique to grow Al 2 O 3 films with nominal thicknesses of 400, 300, and 200 nm on silicon and soda lime glass substrates. The optical properties of the films were investigated by measuring reflection spectra in the 400 1800 nm wavelength range, followed by numerical fitting assuming the Sellmeier formula for the refractive index of Al 2 O 3 . The films grown on glass substrates possess higher refractive indices as compared to the films on silicon. Optical waveguiding is demonstrated, confirming the feasibility of high-index contrast planar waveguides fabricated by atomic layer deposition.

© 2009 Optical Society of America

OCIS Codes
(160.4670) Materials : Optical materials
(160.4760) Materials : Optical properties
(310.2790) Thin films : Guided waves
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Thin Films

Original Manuscript: May 18, 2009
Revised Manuscript: August 14, 2009
Manuscript Accepted: September 11, 2009
Published: September 25, 2009

Pradeep Kumar, Monika K. Wiedmann, Charles H. Winter, and Ivan Avrutsky, "Optical properties of Al2O3 thin films grown by atomic layer deposition," Appl. Opt. 48, 5407-5412 (2009)

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