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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 48, Iss. 29 — Oct. 10, 2009
  • pp: 5432–5437

Extreme-ultraviolet multilayer coatings with high spectral purity for solar imaging

Michele Suman, Maria Guglielmina Pelizzo, David L. Windt, and Piergiorgio Nicolosi  »View Author Affiliations

Applied Optics, Vol. 48, Issue 29, pp. 5432-5437 (2009)

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Future solar experiments designed to perform solar plasma diagnostics will also be based on extreme-ultravilet observations. Multilayer (ML) optics are essential in this spectral region since these coatings have high reflectivity at normal incidence. Typically, the reflectivity curve of a ML coating has a small but finite bandwidth, and this can be a serious drawback when several spectral lines fall within the bandwidth. In fact, spectral lines emitted by different ion species can correspond to different plasma conditions. We present the design, realization, and characterization of an innovative ML structure with high reflectivity coupled with a strong rejection ratio for two adjacent spectral features. The key element is an optimized capping layer structure deposited on top of the ML that preserves the performance reflectance at the target wavelength and at the same time suppresses the reflectance at specific adjacent wavelengths. Application to the Fe xv 3 × 10 6 K coronal emission line at 28.4 nm with rejection of the He ii Lyman-α line at 30.4 nm is presented.

© 2009 Optical Society of America

OCIS Codes
(310.0310) Thin films : Thin films
(350.6090) Other areas of optics : Space optics
(310.4165) Thin films : Multilayer design

ToC Category:
Thin Films

Original Manuscript: July 2, 2009
Revised Manuscript: September 3, 2009
Manuscript Accepted: September 8, 2009
Published: October 1, 2009

Michele Suman, Maria Guglielmina Pelizzo, David L. Windt, and Piergiorgio Nicolosi, "Extreme-ultraviolet multilayer coatings with high spectral purity for solar imaging," Appl. Opt. 48, 5432-5437 (2009)

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