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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 48, Iss. 29 — Oct. 10, 2009
  • pp: 5445–5450

Influence of exponential doping structure on the performance of GaAs photocathodes

Jun Niu, Yijun Zhang, Benkang Chang, Zhi Yang, and Yajuan Xiong  »View Author Affiliations

Applied Optics, Vol. 48, Issue 29, pp. 5445-5450 (2009)

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Obtaining higher quantum efficiency and more stable GaAs photocathodes has been an important developmental direction in the investigation of GaAs photocathodes. One significant approach to this problem is to improve the electron diffusion length. We put forward and investigate an exponential doping mode GaAs photocathode. It was proved by theoretical and experimental results that, because the exponential doping structure is in favor of forming a directional constant built-in electric field, the electron diffusion and drift length of the cathode material can accordingly be enhanced. The mathematical expression of the electron diffusion and drift length L D E of an exponential doping photocathode was deduced, and the relationship between the doping coefficient and the electron diffusion and drift length is made certain. This investigation contributes to the understanding of varied doping GaAs photocathodes and provides guidance to optimize the doping structure of GaAs photocathodes for higher quantum efficiency.

© 2009 Optical Society of America

OCIS Codes
(160.2100) Materials : Electro-optical materials
(250.0250) Optoelectronics : Optoelectronics

ToC Category:

Original Manuscript: April 30, 2009
Revised Manuscript: July 9, 2009
Manuscript Accepted: August 26, 2009
Published: October 1, 2009

Jun Niu, Yijun Zhang, Benkang Chang, Zhi Yang, and Yajuan Xiong, "Influence of exponential doping structure on the performance of GaAs photocathodes," Appl. Opt. 48, 5445-5450 (2009)

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