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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 48, Iss. 29 — Oct. 10, 2009
  • pp: 5459–5463

Annealing effect on the laser-induced damage resistance of Zr O 2 films in vacuum

Xiulan Ling, Shuhong Li, Ming Zhou, Xiaofeng Liu, Yuanan Zhao, Jianda Shao, and Zhengxiu Fan  »View Author Affiliations

Applied Optics, Vol. 48, Issue 29, pp. 5459-5463 (2009)

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By modifying some structural characteristics, the annealing process can have considerable effects on the optical performance and laser-induced damage resistance of Zr O 2 thin films deposited by electron-beam deposition. Annealing at increased temperature gives rise to an increase of refractive index, the evolutions of packing density, and the structure order of the films due to the removal of adsorbed water in advance, material crystallization, and phase transformation. Thus, the combined effects of greatly strengthened endurance, crystal structure ordering, and stress transition after the annealing leads to an increase of the laser-induced damage threshold in a vacuum environment from 12 to 16 J / cm 2 (at 1064 nm , 12 ns pulse duration, and 1-on-1 testing mode).

© 2009 Optical Society of America

OCIS Codes
(310.1620) Thin films : Interference coatings
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties
(310.6870) Thin films : Thin films, other properties

ToC Category:
Thin Films

Original Manuscript: June 30, 2009
Revised Manuscript: September 13, 2009
Manuscript Accepted: September 15, 2009
Published: October 1, 2009

Xiulan Ling, Shuhong Li, Ming Zhou, Xiaofeng Liu, Yuanan Zhao, Jianda Shao, and Zhengxiu Fan, "Annealing effect on the laser-induced damage resistance of ZrO2 films in vacuum," Appl. Opt. 48, 5459-5463 (2009)

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