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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 48, Iss. 29 — Oct. 10, 2009
  • pp: 5464–5466

Broadband extreme ultraviolet multilayer mirror for supercontinuum light at a photon energy of 35 65 eV

Masatoshi Hatayama, Hisataka Takenaka, Eric M. Gullikson, Akira Suda, and Katsumi Midorikawa  »View Author Affiliations


Applied Optics, Vol. 48, Issue 29, pp. 5464-5466 (2009)
http://dx.doi.org/10.1364/AO.48.005464


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Abstract

We have developed a broadband multilayer mirror for photon energies between 35 and 65 eV . This extreme ultraviolet (EUV) mirror has an almost flat reflectivity profile at normal incidence, and the average reflectivity is 8%. The bandwidth of this mirror is 30 eV centered around 50 eV , 1.5 times broader than conventional multilayer mirrors in this energy region. This new mirror can be used in a variety of applications using supercontinuum EUV light sources including attosecond metrology.

© 2009 Optical Society of America

OCIS Codes
(000.2190) General : Experimental physics
(340.7470) X-ray optics : X-ray mirrors

ToC Category:
X-ray Optics

History
Original Manuscript: May 26, 2009
Revised Manuscript: September 12, 2009
Manuscript Accepted: September 15, 2009
Published: October 1, 2009

Citation
Masatoshi Hatayama, Hisataka Takenaka, Eric M. Gullikson, Akira Suda, and Katsumi Midorikawa, "Broadband extreme ultraviolet multilayer mirror for supercontinuum light at a photon energy of 35-65 eV," Appl. Opt. 48, 5464-5466 (2009)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-48-29-5464

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