Design and fabrication of a polarization-independent two-port beam splitter
Applied Optics, Vol. 48, Issue 29, pp. 5636-5641 (2009)
http://dx.doi.org/10.1364/AO.48.005636
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Abstract
We design and manufacture a fused-silica polarization-independent two-port beam splitter grating. The physical mechanism of this deeply etched grating can be shown clearly by using the simplified modal method with consideration of corresponding accumulated phase difference of two excited propagating grating modes, which illustrates that the binary-phase fused-silica grating structure depends little on the incident wavelength, but mainly on the ratio of groove depth to grating period and the ratio of incident wavelength to grating period. These analytic results would also be very helpful for wavelength bandwidth analysis. The exact grating profile is optimized by using the rigorous coupled-wave analysis. Holographic recording technology and inductively coupled plasma etching are used to manufacture the fused-silica grating. Experimental results agree well with the theoretical values.
© 2009 Optical Society of America
OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(060.4510) Fiber optics and optical communications : Optical communications
(230.1360) Optical devices : Beam splitters
(050.6624) Diffraction and gratings : Subwavelength structures
ToC Category:
Optical Devices
History
Original Manuscript: July 15, 2009
Manuscript Accepted: September 13, 2009
Published: October 8, 2009
Citation
Jijun Feng, Changhe Zhou, Jiangjun Zheng, Hongchao Cao, and Peng Lv, "Design and fabrication of a polarization-independent two-port beam splitter," Appl. Opt. 48, 5636-5641 (2009)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-48-29-5636
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