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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 48, Iss. 30 — Oct. 20, 2009
  • pp: 5722–5727

Continuous self-imaging regime with a double-grating mask

Luis Miguel Sanchez-Brea, Francisco Jose Torcal-Milla, and Eusebio Bernabeu  »View Author Affiliations

Applied Optics, Vol. 48, Issue 30, pp. 5722-5727 (2009)

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We analyze the Talbot effect produced by a mask composed of two diffraction gratings. Combinations with phase and amplitude gratings have been studied in the near-field regime. For a two-phase-gratings configuration, the Talbot effect is canceled, even when using monochromatic light; that is, the intensity distribution is nearly independent of the distance from the mask to the observation plane. Therefore, the mechanical tolerances of devices that use the Talbot effect may be improved. In addition, the spatial frequency of the fringes is quadrupled, which improves the accuracy of devices that employ this mask. An experimental verification for the best case two phase gratings, has also been performed, validating the theoretical results.

© 2009 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(050.2770) Diffraction and gratings : Gratings
(230.1950) Optical devices : Diffraction gratings

ToC Category:
Diffraction and Gratings

Original Manuscript: July 14, 2009
Revised Manuscript: September 24, 2009
Manuscript Accepted: October 1, 2009
Published: October 13, 2009

Luis Miguel Sanchez-Brea, Francisco Jose Torcal-Milla, and Eusebio Bernabeu, "Continuous self-imaging regime with a double-grating mask," Appl. Opt. 48, 5722-5727 (2009)

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