Abstract

We analyze the near-field behavior of binary amplitude/phase diffraction gratings, which modulate at the same time the amplitude and phase of the incident light beam. As it is expected, the distance between two consecutive self-images of the grating depends only on the period of the grating and the wavelength of the illumination. However, the location of the self-images depends on the specific properties of the grating. In this work, we analyze the location of the self-images in terms of the Fourier coefficients of the grating, obtaining analytical expressions. This analysis can be useful in applications in which the position of the self-images must be at certain fixed distances from the grating. Finally, an experimental and numerical verification of the proposed theory is performed.

© 2009 Optical Society of America

Continuous self-imaging regime with a double-grating mask

Luis Miguel Sanchez-Brea, Francisco Jose Torcal-Milla, and Eusebio Bernabeu
Appl. Opt. 48(30) 5722-5727 (2009)

Near-field diffraction of gratings with surface defects

Luis Miguel Sanchez-Brea and Francisco Jose Torcal-Milla
Appl. Opt. 49(11) 2190-2197 (2010)

Binary gratings with random heights

José María Rico-García and Luis Miguel Sanchez-Brea
Appl. Opt. 48(16) 3062-3069 (2009)

Operational modes of a ferroelectric LCoS modulator for displaying binary polarization, amplitude, and phase diffraction gratings

Antonio Martínez-García, Ignacio Moreno, María M. Sánchez-López, and Pascuala García-Martínez
Appl. Opt. 48(15) 2903-2914 (2009)

Diffraction by metallic planar gratings

Francisco Jose Torcal-Milla
Appl. Opt. 52(28) 6995-7001 (2013)