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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 48, Iss. 33 — Nov. 20, 2009
  • pp: 6470–6474

Chemical corrosion protection of optical components using atomic layer deposition

Xiaohua Du, Kevin Zhang, Kathy Holland, Thomas Tombler, and Martin Moskovits  »View Author Affiliations


Applied Optics, Vol. 48, Issue 33, pp. 6470-6474 (2009)
http://dx.doi.org/10.1364/AO.48.006470


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Abstract

Very thin films deposited using atomic layer deposition (ALD) on aluminum mirrors showed extraordinary resistance toward concentrated alkali solutions, various chemical etchants, and solvents. Aluminum mirrors with no surface protection dissolved immediately in 24% aqueous KOH. Mirrors protected with 30 nm electron-beam deposited silica film were fully removed in 30 min . Mirrors with 10, 30, and 120 nm films grown by ALD required, respectively, 10, 15, and 60 h of exposure to the alkali for the mirror to be fully removed. Likewise, large-scale hydrogen bubbling was observed immediately upon immersing mirrors coated with electron-beam deposited silica in aqueous KOH, whereas no visible hydrogen bubbling was detected for the mirror protected by ALD silica. For mirrors protected by 120 nm ALD silica, a 2 h soak in various acid and solvent media produced no discernible change.

© 2009 Optical Society of America

OCIS Codes
(160.6030) Materials : Silica
(240.0310) Optics at surfaces : Thin films
(310.1860) Thin films : Deposition and fabrication
(310.1515) Thin films : Protective coatings

ToC Category:
Thin Films

History
Original Manuscript: August 4, 2009
Revised Manuscript: October 30, 2009
Manuscript Accepted: November 2, 2009
Published: November 13, 2009

Citation
Xiaohua Du, Kevin Zhang, Kathy Holland, Thomas Tombler, and Martin Moskovits, "Chemical corrosion protection of optical components using atomic layer deposition," Appl. Opt. 48, 6470-6474 (2009)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-48-33-6470

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