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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 48, Iss. 35 — Dec. 10, 2009
  • pp: 6781–6787

Nonlinear absorption in single La F 3 and Mg F 2 layers at 193 nm measured by surface sensitive laser induced deflection technique

Christian Mühlig, Simon Bublitz, and Siegfried Kufert  »View Author Affiliations

Applied Optics, Vol. 48, Issue 35, pp. 6781-6787 (2009)

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We report nonlinear absorption data of La F 3 and Mg F 2 single layers at 193 nm . A highly surface sensitive measurement strategy of the laser induced deflection technique is introduced and applied to measure the absorption of highly transparent thin films independently of the substrate absorption. Linear absorptions k = ( α × λ ) / 4 π of 2 × 10 4 and 8.5 × 10 4 ( La F 3 ) and 1.8 × 10 4 and 6.9 × 10 4 ( Mg F 2 ) are found. Measured two photon absorption (TPA) coefficients are β = 1 × 10 4 cm / W ( La F 3 ) , 1.8 × 10 5 , and 5.8 × 10 5 cm / W ( Mg F 2 ) . The TPA coefficients are several orders of magnitude higher than typical values for fluoride single crystals, which is likely to result from sequential two step absorption processes.

© 2009 Optical Society of America

OCIS Codes
(020.4180) Atomic and molecular physics : Multiphoton processes
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(300.1030) Spectroscopy : Absorption
(300.6430) Spectroscopy : Spectroscopy, photothermal
(310.3840) Thin films : Materials and process characterization

ToC Category:

Original Manuscript: August 31, 2009
Manuscript Accepted: October 16, 2009
Published: December 3, 2009

Christian Mühlig, Simon Bublitz, and Siegfried Kufert, "Nonlinear absorption in single LaF3 and MgF2 layers at 193 nm measured by surface sensitive laser induced deflection technique," Appl. Opt. 48, 6781-6787 (2009)

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