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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 48, Iss. 5 — Feb. 10, 2009
  • pp: 985–989

Simple method for determination of the thickness of a nonabsorbing thin film using spectral reflectance measurement

Jiři Luňáček, Petr Hlubina, and Milena Luňáčková  »View Author Affiliations

Applied Optics, Vol. 48, Issue 5, pp. 985-989 (2009)

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A method to determine the thickness of a nonabsorbing thin film on an absorbing substrate is presented. A linear relation between the thin-film thickness and the tangent wavelength of the reflectance spectrum for a specific interference order is revealed, which permits the calculation of the thickness provided that the wavelength-dependent optical parameters of the thin film and the substrate are known. The thickness can be calculated precisely from the reflectance spectrum by using one extreme only, as is demonstrated theoretically for Si O 2 thin film on a Si substrate. The application of this method is demonstrated experimentally for the same thin-film structure but with different Si substrates. The results are compared with those given by the algebraic fitting method, and very good agreement is confirmed.

© 2009 Optical Society of America

OCIS Codes
(120.4530) Instrumentation, measurement, and metrology : Optical constants
(240.0310) Optics at surfaces : Thin films

ToC Category:
Instrumentation, Measurement, and Metrology

Original Manuscript: December 1, 2008
Revised Manuscript: January 12, 2009
Manuscript Accepted: January 12, 2009
Published: February 5, 2009

Jiři Luňáček, Petr Hlubina, and Milena Luňáčková, "Simple method for determination of the thickness of a nonabsorbing thin film using spectral reflectance measurement," Appl. Opt. 48, 985-989 (2009)

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