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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 48, Iss. 6 — Feb. 20, 2009
  • pp: 1184–1189

Modified Šolc notch filter for deep ultraviolet applications

Sergei Nikitin, Charles Manka, and Jacob Grun  »View Author Affiliations

Applied Optics, Vol. 48, Issue 6, pp. 1184-1189 (2009)

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We present results of the design and testing of a modified optical Šolc notch filter for use in the deep ultraviolet (DUV, 190 300 nm ) spectral range. The filter was designed to block a specific wavelength in this region. In addition, a sequence of blocked wavelengths occurs at wavelengths both shorter and longer than the specified wavelength. For Raman applications utilizing tunable lasers, the provision of multiple blocked wavelengths by a single filter may be especially useful. The filter design presented here produces extinction ratios > 240 with transmission minima 1 nm full width at half-maximum. Specific results are shown for the Raman spectra of Teflon excited at 248.4 nm .

© 2009 Optical Society of America

OCIS Codes
(230.0230) Optical devices : Optical devices
(230.1150) Optical devices : All-optical devices
(230.5440) Optical devices : Polarization-selective devices
(300.6450) Spectroscopy : Spectroscopy, Raman
(300.6540) Spectroscopy : Spectroscopy, ultraviolet
(230.7408) Optical devices : Wavelength filtering devices

ToC Category:
Optical Devices

Original Manuscript: December 19, 2008
Manuscript Accepted: January 14, 2009
Published: February 19, 2009

Sergei Nikitin, Charles Manka, and Jacob Grun, "Modified Šolc notch filter for deep ultraviolet applications," Appl. Opt. 48, 1184-1189 (2009)

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