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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 48, Iss. 9 — Mar. 20, 2009
  • pp: 1727–1732

Atomic layer deposition of Al 2 O 3 and TiO 2 multilayers for applications as bandpass filters and antireflection coatings

Adriana Szeghalmi, Michael Helgert, Robert Brunner, Frank Heyroth, Ulrich Gösele, and Mato Knez  »View Author Affiliations

Applied Optics, Vol. 48, Issue 9, pp. 1727-1732 (2009)

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Al 2 O 3 and TiO 2 thin films have been deposited on Si wafers, quartz, BK7 glass, and polycarbonate substrates by atomic layer deposition (ALD). The refractive indices and growth rates of the materials have been determined by spectroscopic ellipsometry and transmission electron microscopy. The influence of substrate temperature and precursor on the refractive indices has been investigated. The refractive index of TiO 2 significantly increases with temperature, whereas the Al 2 O 3 films are temperature insensitive. The films deposited using H 2 O 2 as oxygen source show a slightly higher refractive index than the films prepared with H 2 O . Multilayer narrow-bandpass filters and broadband antireflective coatings have been designed and produced by ALD.

© 2009 Optical Society of America

OCIS Codes
(310.0310) Thin films : Thin films
(310.1210) Thin films : Antireflection coatings
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication
(310.4165) Thin films : Multilayer design

ToC Category:
Thin Films

Original Manuscript: January 6, 2009
Revised Manuscript: March 3, 2009
Manuscript Accepted: March 3, 2009
Published: March 13, 2009

Adriana Szeghalmi, Michael Helgert, Robert Brunner, Frank Heyroth, Ulrich Gösele, and Mato Knez, "Atomic layer deposition of Al2O3 and TiO2 multilayers for applications as bandpass filters and antireflection coatings," Appl. Opt. 48, 1727-1732 (2009)

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  1. U. Schulz, U. B. Schallenberg, and N. Kaiser, “Antireflection coating for plastic optics,” Appl. Opt. 41, 3107-3110 (2002). [CrossRef] [PubMed]
  2. V. Janicki, D. Gäbler, S. Wilbrandt, R. Leitel, O. Stenzel, N. Kaiser, M. Lappschies, B. Görtz, D. Ristau, C. Rickers, and M. Vergöhl, “Deposition and spectral performance of an inhomogeneous broadband wide-angular antireflective coating,” Appl. Opt. 45, 7851-7857 (2006). [CrossRef] [PubMed]
  3. M. Yang, A. Gatto, and N. Kaiser, “Design and deposition of vacuum-ultraviolet narrow-bandpass filters for analytical chemistry applications,” Appl. Opt. 45, 1359-1363 (2006). [CrossRef] [PubMed]
  4. F. Flory and L. Escouba, “Optical properties of nanostructured thin films,” Prog. Quantum Electron. 28, 89-112 (2004). [CrossRef]
  5. H. Takashashi, “Temperature stability of thin-film narrow-bandpass filters produced by ion-assisted deposition,” Appl. Opt. 34, 667-675 (1995). [CrossRef] [PubMed]
  6. M. Knez, K. Nielsch, and L. Niinistö, “Synthesis and surface engineering of complex nanostructures by atomic layer deposition,” Adv. Mater. 19, 3425-3438 (2007). [CrossRef]
  7. D. Riihelä, M. Ritala, R. Matero, and M. Leskel, “Introducing atomic layer epitaxy for the deposition of optical thin films,” Thin Solid Films 289, 250-255 (1996). [CrossRef]
  8. R. R. Willey, “Simulation of errors in the monitoring of narrow bandpass filters,” Appl. Opt. 41, 3193-3195 (2002). [CrossRef] [PubMed]
  9. R. R. Willey, “Monitoring thin films of the fence post design and its advantages for narrow bandpass filters,” Appl. Opt. 47, C147-C150 (2008). [CrossRef] [PubMed]
  10. R. R. Willey, Practical Design and Production of Optical Thin Films (Marcel Dekker, 2002). [CrossRef]
  11. J. H. Correia, A. R. Emadi, and R. F. Wolffenbuttel, “UV bandpass optical filter for microspectrometers,” ECS Transactions 4, 141-147 (2006). [CrossRef]
  12. J. Aarik, A. Aidla, A. A. Kiisler, T. Uustare, and W. Sammelselg, “Effect of crystal structure of TiO2 films grown by atomic layer deposition,” Thin Solid Films 305, 270-273 (1997).
  13. A. Kasikov, J. Aarik, H. Mändar, M. Moppel, M. Pärs, and U. Uustare, “Refractive index gradients in TiO2 thin films grown by atomic layer deposition,” J. Phys. D 39, 54-60(2006). [CrossRef]

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