Balanced interferometric system for stability measurements
Applied Optics, Vol. 48, Issue 9, pp. 1733-1740 (2009)
http://dx.doi.org/10.1364/AO.48.001733
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Abstract
We describe two different, double-sided interferometer designs for measuring material stability. Both designs are balanced interferometers where the only optical path difference is the sample and the reference beams are located within the interferometer. One interferometer is a double-pass design, whereas the other is a single-pass system. Based on a tolerancing analysis, the single-pass system is less susceptible to initial component misalignment and motions during experiments. This single-pass interferometer was tested with an
© 2009 Optical Society of America
OCIS Codes
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.3940) Instrumentation, measurement, and metrology : Metrology
ToC Category:
Instrumentation, Measurement, and Metrology
History
Original Manuscript: November 24, 2008
Revised Manuscript: February 9, 2009
Manuscript Accepted: February 10, 2009
Published: March 16, 2009
Citation
Jonathan D. Ellis, Ki-Nam Joo, Jo W. Spronck, and Robert H. Munnig Schmidt, "Balanced interferometric system for stability measurements," Appl. Opt. 48, 1733-1740 (2009)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-48-9-1733
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