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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 49, Iss. 12 — Apr. 20, 2010
  • pp: 2334–2338

Interferometric Shack–Hartmann wavefront sensor with an array of four-hole apertures

David López and Susana Ríos  »View Author Affiliations


Applied Optics, Vol. 49, Issue 12, pp. 2334-2338 (2010)
http://dx.doi.org/10.1364/AO.49.002334


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Abstract

A modified Hartmann test based on the interference produced by a four-hole mask can be used to measure an unknown wavefront. To scan the wavefront, the interference pattern is measured for different positions of the mask. The position of the central fringe of the diamond-shaped interference pattern gives a measure of the local wavefront slopes. Using a set of four-hole apertures located behind an array of lenslets in such a way that each four-hole window is inside one lenslet area, a set of four-hole interference patterns can be obtained in the back focal plane of the lenslets without having to scan the wavefront. The central fringe area of each interference pattern is narrower than the area of the central maximum of the diffraction pattern of the lenslet, increasing the accuracy in the estimate of the lobe position as compared with the Shack–Hartmann wavefront sensor.

© 2010 Optical Society of America

OCIS Codes
(010.7350) Atmospheric and oceanic optics : Wave-front sensing
(050.1220) Diffraction and gratings : Apertures
(100.2960) Image processing : Image analysis
(120.3180) Instrumentation, measurement, and metrology : Interferometry

ToC Category:
Instrumentation, Measurement, and Metrology

History
Original Manuscript: October 22, 2009
Revised Manuscript: January 27, 2010
Manuscript Accepted: March 19, 2010
Published: April 14, 2010

Citation
David López and Susana Ríos, "Interferometric Shack–Hartmann wavefront sensor with an array of four-hole apertures," Appl. Opt. 49, 2334-2338 (2010)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-49-12-2334

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