OSA's Digital Library

Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 49, Iss. 15 — May. 20, 2010
  • pp: 2753–2760

Even aberration measurement of lithographic projection optics based on intensity difference of adjacent peaks in alternating phase-shifting mask image

Bo Peng, Xiangzhao Wang, Zicheng Qiu, Yuting Cao, and Lifeng Duan  »View Author Affiliations


Applied Optics, Vol. 49, Issue 15, pp. 2753-2760 (2010)
http://dx.doi.org/10.1364/AO.49.002753


View Full Text Article

Enhanced HTML    Acrobat PDF (861 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

We propose an in situ technique for measuring an even aberration of lithographic projection optics. By using the Hopkins theory of partially coherent imaging and the thick-mask model, the linear relationship between the intensity difference of adjacent peaks in an alternating phase-shifting mask image and an even aberration is established by equations and verified by numerical results. The sensitivity of measuring the even aberration of lithographic projection optics based on this linear relationship is analyzed, and the measurement mark is designed accordingly. Measurement performance of the present technique is evaluated using the lithographic simulator PROLITH, which shows that the present technique is capable of measuring the even aberration of lithographic projection optics with ultrahigh measurement accuracy.

© 2010 Optical Society of America

OCIS Codes
(050.5080) Diffraction and gratings : Phase shift
(110.3960) Imaging systems : Microlithography
(120.3940) Instrumentation, measurement, and metrology : Metrology

ToC Category:
Diffraction and Gratings

History
Original Manuscript: March 15, 2010
Revised Manuscript: April 19, 2010
Manuscript Accepted: April 20, 2010
Published: May 12, 2010

Citation
Bo Peng, Xiangzhao Wang, Zicheng Qiu, Yuting Cao, and Lifeng Duan, "Even aberration measurement of lithographic projection optics based on intensity difference of adjacent peaks in alternating phase-shifting mask image," Appl. Opt. 49, 2753-2760 (2010)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-49-15-2753

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited