Computational manufacturing of optical interference coatings: method, simulation results, and comparison with experiment
Applied Optics, Vol. 49, Issue 16, pp. 3150-3162 (2010)
http://dx.doi.org/10.1364/AO.49.003150
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Abstract
Virtual deposition runs have been performed to estimate the production yield of selected oxide optical interference coatings when plasma ion-assisted deposition with an advanced plasma source is applied. Thereby, deposition of each layer can be terminated either by broadband optical monitoring or quartz crystal monitoring. Numerous deposition runs of single-layer coatings have been performed to investigate the reproducibility of coating properties and to quantify deposition errors for the simulation. Variations of the following parameters are considered in the simulation: refractive index, extinction coefficient, and film thickness. The refractive index and the extinction coefficient are simulated in terms of the oscillator model. The parameters are varied using an apodized normal distribution with known mean value and standard deviation. Simulation of variations in the film thickness is performed specific to the selected monitoring strategy. Several deposition runs of the selected oxide interference coatings have been performed to verify the simulation results by experimental data.
© 2010 Optical Society of America
OCIS Codes
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties
(310.4165) Thin films : Multilayer design
ToC Category:
Thin Films
History
Original Manuscript: March 29, 2010
Revised Manuscript: May 10, 2010
Manuscript Accepted: May 11, 2010
Published: May 31, 2010
Citation
Karen Friedrich, Steffen Wilbrandt, Olaf Stenzel, Norbert Kaiser, and Karl Heinz Hoffmann, "Computational manufacturing of optical interference coatings: method, simulation results, and comparison with experiment," Appl. Opt. 49, 3150-3162 (2010)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-49-16-3150
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