Spectral dependence of the refractive index of chemical vapor deposition ZnSe grown on substrate with an optimized temperature increase
Applied Optics, Vol. 49, Issue 25, pp. 4723-4727 (2010)
http://dx.doi.org/10.1364/AO.49.004723
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Abstract
Precise measurement of the refractive index of chemical vapor deposition (CVD) ZnSe with the Fourier-transform interference refractometry method from 0.9 to
© 2010 Optical Society of America
OCIS Codes
(160.4760) Materials : Optical properties
(160.6000) Materials : Semiconductor materials
ToC Category:
Materials
History
Original Manuscript: April 19, 2010
Revised Manuscript: July 14, 2010
Manuscript Accepted: July 19, 2010
Published: August 25, 2010
Citation
V. O. Nazaryants, E. B. Kryukova, E. M. Gavrishchuk, V. B. Ikonnikov, S. M. Mazavin, and V. G. Plotnichenko, "Spectral dependence of the refractive index of chemical vapor deposition ZnSe grown on substrate with an optimized temperature increase," Appl. Opt. 49, 4723-4727 (2010)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-49-25-4723
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