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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 49, Iss. 28 — Oct. 1, 2010
  • pp: 5474–5479

Combination of scene-based and stochastic measurement for wide-field aberration correction in microscopic imaging

Michael Warber, Selim Maier, Tobias Haist, and Wolfgang Osten  »View Author Affiliations


Applied Optics, Vol. 49, Issue 28, pp. 5474-5479 (2010)
http://dx.doi.org/10.1364/AO.49.005474


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Abstract

We report on a novel aberration correction technique that uses the sequential combination of two different aberration measurement methods to correct for setup-induced and specimen-induced aberrations. The advantages of both methods are combined and, thus, the measurement time is strongly reduced without loss of accuracy. The technique is implemented using a spatial-light-modulator-based wide-field microscope without the need for additional components (e.g., a Shack–Hartmann sensor). The aberrations are measured without a reference object by directly using the specimen to be imaged. We demonstrate experimental results for technical as well as biological specimens.

© 2010 Optical Society of America

OCIS Codes
(180.0180) Microscopy : Microscopy
(120.1088) Instrumentation, measurement, and metrology : Adaptive interferometry
(070.6120) Fourier optics and signal processing : Spatial light modulators
(220.1080) Optical design and fabrication : Active or adaptive optics

ToC Category:
Microscopy

History
Original Manuscript: May 10, 2010
Revised Manuscript: September 1, 2010
Manuscript Accepted: September 5, 2010
Published: September 30, 2010

Virtual Issues
Vol. 5, Iss. 14 Virtual Journal for Biomedical Optics

Citation
Michael Warber, Selim Maier, Tobias Haist, and Wolfgang Osten, "Combination of scene-based and stochastic measurement for wide-field aberration correction in microscopic imaging," Appl. Opt. 49, 5474-5479 (2010)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-49-28-5474

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