We present a new method for in situ monitoring of a grating profile during the development process to control the critical dimensions of surface-relief rectangular photoresist gratings on transparent substrates. A He–Ne laser of visible wavelength is employed as the monitoring light source. We determine the height of the grating ridges from the first minimum value of the diffraction intensity curve of the zeroth transmission order and then obtain the duty cycle of the grating from the diffraction intensity of the $-1$ st transmission order. The effectiveness of our method has been demonstrated through the fabrication of rectangular photoresist gratings of 1200, 2200, and $3000\text{\hspace{0.17em} lines}/\mathrm{mm}$ on glass substrates. The experimental results are statistically compared with results extracted from scanning electron micrographs. Good agreement between the online, real-time measured results and the scanning electron microscopy results is obtained.

© 2010 Optical Society of America

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

Related Journal Articles

• Optical Scatterometry of Subwavelength Diffraction Gratings: Neural-Network Approach (AO)
• In situ technique for measuring the orthogonality of a plane wave to a substrate (OL)
• Six-Degrees-of-Freedom Alignment Technique that Provides Diagnostic Misalignment Information (AO)
• Measurement of duty cycles of photoresist grating masks made on top of multilayer dielectric stacks (AO)
• Measurement of photoresist grating profiles based on multiwavelength scatterometry and artificial neural network (AO)

Related Conference Papers

• The Use of Circular Dammann Gratings (CDG) in Angle Measurement
• The Use of Circular Dammann Gratings (CDG) in Angle Measurement
• Cross-Sectional Geometry Control of Low-Loss Biconical Fiber Tapers Using Hydrofluoric Acid Flow Etching
• Cross-Sectional Geometry Control of Low-Loss Biconical Fiber Tapers Using Hydrofluoric Acid Flow Etching
• Performance of Large Period Engineered Grating for Solar Cell Applications
• Performance of Large Period Engineered Grating for Solar Cell Applications
• Optimization of Silicon Solar Cells using Backside Diffraction Gratings
• Optimization of Silicon Solar Cells using Backside Diffraction Gratings