Diffraction–attenuation resistant beams: their higher-order versions and finite-aperture generations
Applied Optics, Vol. 49, Issue 30, pp. 5861-5869 (2010)
http://dx.doi.org/10.1364/AO.49.005861
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Abstract
Recently, a method for obtaining diffraction–attenuation resistant beams in absorbing media has been developed in terms of suitable superposition of ideal zero-order Bessel beams. In this work, we show that such beams keep their resistance to diffraction and absorption even when generated by finite apertures. Moreover, we shall extend the original method to allow a higher control over the transverse intensity profile of the beams. Although the method is developed for scalar fields, it can be applied to paraxial vector wave fields, as well. These new beams have many potential applications, such as in free-space optics, medical apparatus, remote sensing, and optical tweezers.
© 2010 Optical Society of America
OCIS Codes
(140.3300) Lasers and laser optics : Laser beam shaping
(260.1960) Physical optics : Diffraction theory
(350.7420) Other areas of optics : Waves
ToC Category:
Lasers and Laser Optics
History
Original Manuscript: July 16, 2010
Manuscript Accepted: August 19, 2010
Published: October 18, 2010
Citation
Michel Zamboni-Rached, Leonardo A. Ambrósio, and Hugo E. Hernández-Figueroa, "Diffraction–attenuation resistant beams: their higher-order versions and finite-aperture generations," Appl. Opt. 49, 5861-5869 (2010)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-49-30-5861
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