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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 49, Iss. 31 — Nov. 1, 2010
  • pp: 5959–5963

Moiré-based focusing and leveling scheme for optical projection lithography

Wei Yan, Yong Yang, Wangfu Chen, Song Hu, and Shaolin Zhou  »View Author Affiliations


Applied Optics, Vol. 49, Issue 31, pp. 5959-5963 (2010)
http://dx.doi.org/10.1364/AO.49.005959


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Abstract

During the process of integrated circuit manufacturing, positioning techniques, such as leveling and focusing, are among the key factors in improving the resolution of optical lithography and related lithographic tools. We present a measurement scheme based on the proverbial moiré effect for focus positioning in projection lithography. The framework of this scheme is based on a fundamental model of dual gratings and can also be decomposed into a dual 4 f optical system. In this scheme, the moiré effect that usually occurs in the superposition of two gratings also comes forth when they are located at two sides of the dual 4 f optical system, which puts one grating together with the other by optical imaging. Related results of this basic dual-grating model have been concluded. The framework of this scheme is built, and the complex structure is explored when similarly broken down to a basic model of two superposed proximity gratings. Finally, experimental results and corresponding analyses indicate that focusing resolution at the nanometer level can be realized by this scheme.

© 2010 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(070.2580) Fourier optics and signal processing : Paraxial wave optics
(220.2560) Optical design and fabrication : Propagating methods
(220.3740) Optical design and fabrication : Lithography

ToC Category:
Active and Adaptive Optics

History
Original Manuscript: January 5, 2010
Revised Manuscript: March 5, 2010
Manuscript Accepted: April 26, 2010
Published: May 19, 2010

Citation
Wei Yan, Yong Yang, Wangfu Chen, Song Hu, and Shaolin Zhou, "Moiré-based focusing and leveling scheme for optical projection lithography," Appl. Opt. 49, 5959-5963 (2010)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-49-31-5959


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References

  1. W. Jiang, S. Hu, Y. Yang, L. Zhao, W. Yan, S. Zhou, and W. Chen, “Study on laser direct writing system for 32nm node,” Proc. SPIE 7284, 72840C (2009). [CrossRef]
  2. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, “Nanoimprint lithography,” J. Vac. Sci. Technol. B 14, 4129–4130 (1996). [CrossRef]
  3. R. Menon, E. E. Moon, M. K. Mondol, F. J. Castaño, and H. I. Smith, “Scanning-spatial-phase alignment for zone-plate-array lithography,” J. Vac. Sci. Technol. B 22, 3382–3385 (2004). [CrossRef]
  4. T. Huang, S. Liu, P. Yi, and T. Shi, “Focusing and leveling system for optical lithography using linear CCD,” Proc. SPIE 7160, 71602X (2009).
  5. X. Li and F. Chen, “Measurement model of focusing and leveling measurement system for projection lithography tool,” Acta Opt Sin. 27, 1987–1991 (2007).
  6. S. Wittekoek, M. van den Brink, H. Linders, J. Stoeldrayer, J. W. D. Martens, and D. Ritchie, “Deep UV wafer stepper with through the lens wafer to reticle alignment,” Proc. SPIE 1264, 534–547 (1990).
  7. D. Kim, W.-I. Jang, B.-Y. Choi, Y. I. Lee, J.-H. Lee, H. J. Yoo, S. W. Kang, and J. H. Kwon, “Focusing and leveling system using position-sensitive detectors for the wafer steppers,” Proc. SPIE 2197, 997–1003 (1994). [CrossRef]
  8. K. Suzuki, S. Wakamoto, and K. Nishi, “KrF step-and-scan exposure system using higher-NA projection lens,” Proc. SPIE 2726, 767–779 (1996). [CrossRef]
  9. T. Hagiwara, M. Hamatani, H. Tashiro, E. Morita, S. Okita, and N. Kondo, “Wafer edge-shot algorithm for wafer scanners,” Proc. SPIE 4691, 790–801 (2002). [CrossRef]
  10. G. Jun, “Solution to improving certain kinds of focusing and leveling measurement system,” Proc. SPIE 6724, 67240M(2007). [CrossRef]
  11. J. E. Vanderwerf, “Optical focus and level sensor for wafer steppers,” J. Vac. Sci. Technol. B 10, 735–740 (1992). [CrossRef]
  12. M. Watanabe, Y. Oshida, Y. Nakayama, R. Funatsu, A. Inagaki, A. Fujii, and T. Ninomiya, “Shot leveling and focusing with interferometry for optical lithography of sub-half-micron LSI,” Jpn. J. Appl. Phys. 32, 5867–5873 (1993). [CrossRef]
  13. M. Watanabe, Y. Oshida, Y. Nakayama, M. Yoshida, R. Funatsu, A. Fujii, and T. Ninomiya, “Focusing and leveling based on wafer surface profile detection with interferometry for optical lithography,” Proc. SPIE 2197, 980–989 (1994). [CrossRef]
  14. X. Li, F. Chen, and Z. Li, “Simulation on signal processing of focusing and leveling measurement system,” Proc. SPIE 6724, 67241R (2007). [CrossRef]
  15. S. Zhou, Y. Fu, X. Tang, S. Hu, W. Chen, and Y. Yang, “Fourier-based analysis of moiré fringe patterns of superposed gratings in alignment of nanolithography,” Opt. Express 16, 7869–7880(2008). [CrossRef] [PubMed]
  16. W. Chen, W. Yan, S. Hu, Y. Yang, and S. Zhou, “Extended dual-grating alignment method for optical projection lithography,” Appl. Opt. 49, 708–713 (2010). [CrossRef] [PubMed]

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