OSA's Digital Library

Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 49, Iss. 32 — Nov. 10, 2010
  • pp: 6268–6275

Two-spherical-wave ultraviolet interferometer for making an antireflective subwavelength periodic pattern on a curved surface

Akio Mizutani, Shumpei Takahira, and Hisao Kikuta  »View Author Affiliations

Applied Optics, Vol. 49, Issue 32, pp. 6268-6275 (2010)

View Full Text Article

Enhanced HTML    Acrobat PDF (903 KB)

Browse Journals / Lookup Meetings

Browse by Journal and Year


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools



An ultraviolet two-spherical-wave interferometer was developed in order to make a subwavelength structured surface on a curved surface. The change in fringe period on the curved surface was significantly suppressed compared with the two-plane-wave interferometer. The optical setup method for suppressing the change in fringe period is described. The effect of the two-spherical-wave interferometer was investigated by numerical simulations. In an experimental demonstration for a concave spherical surface with 11.1 mm radius of curvature and 10 mm diameter, the change in period of the photoresist pattern was reduced to 12 nm for the target period of 250 nm .

© 2010 Optical Society of America

OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(230.4000) Optical devices : Microstructure fabrication
(310.1210) Thin films : Antireflection coatings
(050.6624) Diffraction and gratings : Subwavelength structures
(310.6628) Thin films : Subwavelength structures, nanostructures
(240.3990) Optics at surfaces : Micro-optical devices

ToC Category:
Optical Devices

Original Manuscript: August 5, 2010
Revised Manuscript: October 1, 2010
Manuscript Accepted: October 1, 2010
Published: November 4, 2010

Akio Mizutani, Shumpei Takahira, and Hisao Kikuta, "Two-spherical-wave ultraviolet interferometer for making an antireflective subwavelength periodic pattern on a curved surface," Appl. Opt. 49, 6268-6275 (2010)

Sort:  Author  |  Year  |  Journal  |  Reset  


  1. S. J. Wilson and M. C. Hutley, “The optical properties of ‘moth eye’ antireflection surfaces,” Opt. Acta 29, 993–1009 (1982). [CrossRef]
  2. D. H. Raguin and G. M. Morris, “Antireflection structured surfaces for the infrared spectral region,” Appl. Opt. 32, 1154–1167 (1993). [CrossRef] [PubMed]
  3. Y. Kanamori, M. Sasaki, and K. Hane, “Broadband antireflection gratings fabricated upon silicon substrates,” Opt. Lett. 24, 1422–1424 (1999). [CrossRef]
  4. H. Toyota, K. Takahara, M. Okano, T. Yotsuya, and H. Kikuta, “Fabrication of microcone array for antireflection structured surface using metal dotted pattern,” Jpn. J. Appl. Phys. 40, L747–L749 (2001). [CrossRef]
  5. M. Karlsson and F. Nikolajeff, “Diamond micro-optics: microlenses and antireflection structured surface for the infrared spectral region,” Opt. Express 11, 502–507 (2003). [CrossRef] [PubMed]
  6. A. Gombert, W. Glaubitt, K. Rose, J. Dreibholz, B. Blasi, A. Heinzel, D. Sporn, W. Doll, and V. Wittwer, “Subwavelength-structured antireflective surfaces on glass,” Thin Solid Films 351, 73–78 (1999). [CrossRef]
  7. C. David, P. Haberling, M. Schnierper, J. Sochtig, and C. Zschokke, “Nano-structured anti-reflective surface replicated by hot embossing,” Microelectron. Eng. 61–62, 435–440(2002). [CrossRef]
  8. Y. Hirai, and Y. Tanaka, “Application of nano-imprint lithography,” J. Photopolym. Sci. Technol. 15, 475–480 (2002). [CrossRef]
  9. Y. Kanamori, E. Roy, and Y. Chen, “Antireflection sub-wavelength gratings fabricated by spin-coating replication,” Microelectron. Eng. 78–79, 287–293 (2005). [CrossRef]
  10. K. M. Baker, “Highly corrected closed-packed microlens array and moth-eye structuring on curved surface,” Appl. Opt. 38, 352–356 (1999). [CrossRef]
  11. S. Kobayashi, A. Yamaguchi, S. Sumi, M. Higuchi, and Y. Maeno, “Production method of curved-surface metal mold having fine uneven structure and production method of optical element using this metal mold,” PCT/JP2005/005012 (2005) or U.S. patent application 10,594,154 (2007).
  12. K. Yamada, M. Umetani, T. Tamura, Y. Tanaka, H. Kasa, and J. Nishii, “Antireflective structure imprinted on the surface of optical glass by SiC mold,” Appl. Surf. Sci. 255, 4267–4270(2009). [CrossRef]
  13. J. Nishii, “Glass-imprinting for optical device fabrication,” in Advances in Optical Materials, OSA Technical Digest (CD) (Optical Society of America, 2009), paper AThC1.
  14. A. Mizutani, Y. Kobayashi, A. Maruyama, and H. Kikuta, “Raytracing of an aspherical lens with antireflective subwavelength structured surfaces,” J. Opt. Soc. Am. A 26, 337–341(2009). [CrossRef]
  15. T. Kita and T. Harada, “Ruling engine using a piezoelectric device for large and high-groove density gratings,” Appl. Opt. 31, 1399–1406 (1992). [CrossRef] [PubMed]
  16. C. H. Ko, B. Y. Shew, M. C. Liang, C. C. Lui, and C. K. Lo, “An x-ray-LIGA-fabricated spectrometer chip for wavelength demultiplexing,” presented at the 2004 IEEE/LEOS International Conference on Optical MEMS and Their Applications (Optical MEMS 2004), Takamatsu, Kagawa, Japan, 2004 (unpublished), p. 136. [PubMed]
  17. P. Ruchhoeft, M. Colburn, B. Choi, H. Nounu, S. Johnson, T. Bailey, S. Damle, M. Stewart, J. Ekerdt, S. V. Sreenivasan, J. C. Wolfe, and C. G. Willson, “Patterning curved surfaces: template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography,” J. Vac. Sci. Technol. B 17, 2965–2969 (1999). [CrossRef]
  18. Y. Xie, Z. Lu, and F. Li, “Lithographic fabrication of large curved hologram by laser writer,” Opt. Express 12, 1810–1814(2004). [CrossRef] [PubMed]
  19. D. W. Wilson, P. D. Maker, R. E. Muller, P. Z. Mouroulis, and J. Backlund, “Recent advances in blazed grating fabrication by electron-beam lithography,” Proc. SPIE 5173, 115–126(2003). [CrossRef]
  20. T. Yanagishita, K. Nishio, and H. Masuda, “Anti-reflection structures on lenses by nanoimprinting using ordered anodic porous alumina,” Appl. Phys. Express 2, 022001(2009). [CrossRef]
  21. Y.-P. Chen, Y.-P. Lee, J.-H. Chang, and L. A. Wang, “Fabrication of concave gratings by curved surface UV-nanoimprint lithography,” J. Vac. Sci. Technol. B 26, 1690–1695 (2008). [CrossRef]
  22. K. Kintaka, J. Nishii, and N. Tohge, “Diffraction gratings of photosensitive ZrO2 gel films fabricated with the two-ultraviolet-beam interference method,” Appl. Opt. 39, 489–493 (2000). [CrossRef]
  23. K. M. Baker, “Highly corrected submicrometer grid patterning on curved surfaces,” Appl. Opt. 38, 339–351 (1999). [CrossRef]
  24. E. Hecht, “Interference,” in Optics3rd ed. (Addison Wesley Longman, 1997), Chap. 9, p. 381.

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited