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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 49, Iss. 32 — Nov. 10, 2010
  • pp: 6268–6275

Two-spherical-wave ultraviolet interferometer for making an antireflective subwavelength periodic pattern on a curved surface

Akio Mizutani, Shumpei Takahira, and Hisao Kikuta  »View Author Affiliations


Applied Optics, Vol. 49, Issue 32, pp. 6268-6275 (2010)
http://dx.doi.org/10.1364/AO.49.006268


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Abstract

An ultraviolet two-spherical-wave interferometer was developed in order to make a subwavelength structured surface on a curved surface. The change in fringe period on the curved surface was significantly suppressed compared with the two-plane-wave interferometer. The optical setup method for suppressing the change in fringe period is described. The effect of the two-spherical-wave interferometer was investigated by numerical simulations. In an experimental demonstration for a concave spherical surface with 11.1 mm radius of curvature and 10 mm diameter, the change in period of the photoresist pattern was reduced to 12 nm for the target period of 250 nm .

© 2010 Optical Society of America

OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(230.4000) Optical devices : Microstructure fabrication
(310.1210) Thin films : Antireflection coatings
(050.6624) Diffraction and gratings : Subwavelength structures
(310.6628) Thin films : Subwavelength structures, nanostructures
(240.3990) Optics at surfaces : Micro-optical devices

ToC Category:
Optical Devices

History
Original Manuscript: August 5, 2010
Revised Manuscript: October 1, 2010
Manuscript Accepted: October 1, 2010
Published: November 4, 2010

Citation
Akio Mizutani, Shumpei Takahira, and Hisao Kikuta, "Two-spherical-wave ultraviolet interferometer for making an antireflective subwavelength periodic pattern on a curved surface," Appl. Opt. 49, 6268-6275 (2010)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-49-32-6268


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