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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 49, Iss. 35 — Dec. 10, 2010
  • pp: 6710–6717

Interferometric lithography for nanoscale feature patterning: a comparative analysis between laser interference, evanescent wave interference, and surface plasmon interference

Kandammathe Valiyaveedu Sreekanth, Jeun Kee Chua, and Vadakke Matham Murukeshan  »View Author Affiliations

Applied Optics, Vol. 49, Issue 35, pp. 6710-6717 (2010)

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In this paper, we experimentally demonstrate and compare single-exposure multiple-beam interference lithography based on conventional laser interference, evanescent wave interference, and surface plasmon interference. The proposed two-beam and four-beam interference approaches are carried out theoretically and verified experimentally, employing the proposed configurations so as to realize the patterning of one- and two-dimensional periodic features on photoresists. A custom-fabricated grating is employed in the configuration in order to achieve two- and four-beam interference.

© 2010 Optical Society of America

OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(240.6680) Optics at surfaces : Surface plasmons
(260.3910) Physical optics : Metal optics

ToC Category:
Optical Design and Fabrication

Original Manuscript: July 29, 2010
Revised Manuscript: October 26, 2010
Manuscript Accepted: October 27, 2010
Published: December 1, 2010

Kandammathe Valiyaveedu Sreekanth, Jeun Kee Chua, and Vadakke Matham Murukeshan, "Interferometric lithography for nanoscale feature patterning: a comparative analysis between laser interference, evanescent wave interference, and surface plasmon interference," Appl. Opt. 49, 6710-6717 (2010)

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