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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 49, Iss. 9 — Mar. 20, 2010
  • pp: 1503–1512

Angle-resolved scattering and reflectance of extreme-ultraviolet multilayer coatings: measurement and analysis

Sven Schröder, Tobias Herffurth, Marcus Trost, and Angela Duparré  »View Author Affiliations

Applied Optics, Vol. 49, Issue 9, pp. 1503-1512 (2010)

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Roughness-induced light scattering critically affects the performance of optical components, in particular at short wavelengths. We present a stand-alone instrument for angle-resolved scattering and reflectance measurements at 13.5 nm in the extreme-ultraviolet (EUV) spectral range. The achieved dynamic range allows even the scattering of high-quality EUV mirrors on extremely smooth substrates to be investigated. For Mo/Si multilayers, total scatter losses of several percent have been observed, depending on the substrate qualities as well as on roughening and smoothing effects during coating. Different approximate models for estimating the impact of roughness on scatter losses are discussed and compared with experimental results.

© 2010 Optical Society of America

OCIS Codes
(120.5700) Instrumentation, measurement, and metrology : Reflection
(120.5820) Instrumentation, measurement, and metrology : Scattering measurements
(120.6660) Instrumentation, measurement, and metrology : Surface measurements, roughness
(310.0310) Thin films : Thin films
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)

ToC Category:
Thin Films

Original Manuscript: October 30, 2009
Revised Manuscript: February 18, 2010
Manuscript Accepted: February 18, 2010
Published: March 10, 2010

Sven Schröder, Tobias Herffurth, Marcus Trost, and Angela Duparré, "Angle-resolved scattering and reflectance of extreme-ultraviolet multilayer coatings: measurement and analysis," Appl. Opt. 49, 1503-1512 (2010)

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